A system for polishing a semiconductor wafer, the system comprising a wafer polishing assembly for polishing a face of a semiconductor wafer at a polishing rate and a polishing uniformity, the wafer polishing assembly including a platen subassembly defining a polishing area, a slurry supply ...http://www.google.se/patents/US5730642?utm_source=gb-gplus-sharePatent US5730642 - System for real-time control of semiconductor wafer polishing including optical montoring
System for real-time control of semiconductor wafer polishing including ...
