US 20020133129A1
(19) United States
(12) Patent Application Publication (io) Pub. No.: US 2002/0133129 Al
Arias et al. (43) Pub. Date: Sep. 19,2002
(54) METHOD OF MANUFACTURING
MICRONEEDLE STRUCTURES USING SOFT
LITHOGRAPHY AND
PHOTOLITHOGRAPHY
(76) Inventors: Francisco Arias, Cincinnati, OH (US);
Faiz Feisal Sherman, West Chester,
OH (US); Graver David Owens,
Fairfield, OH (US)
Correspondence Address:
THE PROCTER & GAMBLE COMPANY
INTELLECTUAL PROPERTY DIVISION
WINTON HILL TECHNICAL CENTER - BOX
161
6110 CENTER HILL AVENUE
CINCINNATI, OH 45224 (US)
(21) Appl. No.: 09/808,534
(22) Filed: Mar. 14, 2001
Publication Classification
(51) Int. CI.7 A61B 17/20; B29C 67/00
(52) U.S. CI 604/272; 606/186; 264/400;
264/225
(57) ABSTRACT
A method for manufacturing microneedle structures is disclosed using soft lithography and photolithography, in which micromold structures made of a photoresist material or PDMS are created. The micromold manufacturing occurs quite quickly, using inexpensive materials and processes. Once the molds are available, using moldable materials such as polymers, microneedle arrays can be molded or embossed in relatively fast procedures. In some cases a sacrificial layer is provided between the forming micromold and its substrate layer, for ease of separation. The microneedles themselves can be solid projections, hollow "microtubes," or shallow "microcups." Electrodes can be formed on the microneedle arrays, including individual electrodes per hollow microtube.
