Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus), (b) for removing residual corrosive compounds formed by the sample treatment, (c) for wet-processing of the samples...http://www.google.se/patents/US5868854?utm_source=gb-gplus-sharePatent US5868854 - Method and apparatus for processing samples
