The invention provides a polishing pad comprising a body having a top surface comprising a first set of grooves with a first depth and first width and a bottom surface comprising a second set of grooves with a second depth and second width, wherein the first set of grooves and second set of grooves are...http://www.google.se/patents/US20040259479?utm_source=gb-gplus-sharePatent US20040259479 - Polishing pad for electrochemical-mechanical polishing
