Disclosed is an improved parylene deposition chamber wherein reactive monomer vapors enter the chamber tangentially so as to create a rotational flow of vapor within the interior of the chamber. A substrate support fixture is positioned within the chamber and rotated in a direction counter to the rotational...http://www.google.se/patents/US6406544?utm_source=gb-gplus-sharePatent US6406544 - Parylene deposition chamber and method of use
