A lithographic apparatus is disclosed. The apparatus includes a cleaning system for cleaning a component in the lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged...http://www.google.se/patents/US20060072085?utm_source=gb-gplus-sharePatent US20060072085 - Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
