A system and method for detecting and preventing arcing in plasma processing systems. Arcing is detected and characterized by measuring and analyzing electrical signals from a circuit coupled to the plasma. After characterization, the electrical signals can then be correlated with arcing events occurring...http://www.google.se/patents/US6332961?utm_source=gb-gplus-sharePatent US6332961 - Device and method for detecting and preventing arcing in RF plasma systems
