A plasma reactor having a reactor chamber and an electrostatic chuck with a surface for holding a workpiece inside the chamber includes a backside gas pressure source coupled to the electrostatic chuck for applying a thermally conductive gas under a selected pressure into a workpiece-surface interface...http://www.google.se/patents/US8092639?utm_source=gb-gplus-sharePatent US8092639 - Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
