A polishing apparatus for polishing a workpiece such as a semiconductor wafer has a turntable with an abrasive cloth mounted on an upper surface thereof, and a top ring for holding a workpiece and pressing the workpiece against the abrasive cloth under a first pressing force to polish the workpiece....http://www.google.se/patents/US6350346?utm_source=gb-gplus-sharePatent US6350346 - Apparatus for polishing workpiece
