A method for fabricating cylindrical sputter targets for rotary cylindrical cathodes used in depositing a dielectric layer of desired alloy on non-planar substrates during sputtering is disclosed. The method includes forming a cooling tube having a passage within to receive a cooling medium, then fabricating...http://www.google.se/patents/US6582572?utm_source=gb-gplus-sharePatent US6582572 - Target fabrication method for cylindrical cathodes
