Method and apparatus for process control of electro-processes. The method includes electro-processing a wafer by the application of two or more biases and determining an amount of charge removed as a result of each bias, separately. In one embodiment, an endpoint is determined for each bias when the...http://www.google.se/patents/US7112270?utm_source=gb-gplus-sharePatent US7112270 - Algorithm for real-time process control of electro-polishing
