Reactive atom plasma processing can be used to shape, polish, planarize, and clean surfaces of difficult materials with minimal subsurface damage. The apparatus and methods use a plasma torch, such as a conventional ICP torch. The workpiece and plasma torch are moved with respect to each other, whether...http://www.google.se/patents/US7311851?utm_source=gb-gplus-sharePatent US7311851 - Apparatus and method for reactive atom plasma processing for material deposition
