WO2004059383A3 - Fluoride in supercritical fluid for photoresist and residue removal - Google Patents

Fluoride in supercritical fluid for photoresist and residue removal Download PDF

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Publication number
WO2004059383A3
WO2004059383A3 PCT/US2003/040105 US0340105W WO2004059383A3 WO 2004059383 A3 WO2004059383 A3 WO 2004059383A3 US 0340105 W US0340105 W US 0340105W WO 2004059383 A3 WO2004059383 A3 WO 2004059383A3
Authority
WO
WIPO (PCT)
Prior art keywords
fluoride
cleaning solution
residue
supercritical cleaning
supercritical
Prior art date
Application number
PCT/US2003/040105
Other languages
French (fr)
Other versions
WO2004059383A2 (en
Inventor
Paul E Schilling
Original Assignee
Supercritical Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Supercritical Systems Inc filed Critical Supercritical Systems Inc
Priority to AU2003297212A priority Critical patent/AU2003297212A1/en
Publication of WO2004059383A2 publication Critical patent/WO2004059383A2/en
Publication of WO2004059383A3 publication Critical patent/WO2004059383A3/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids

Abstract

A method and system for removing a residue from a substrate material is disclosed. The method and system utilize a supercritical cleaning solution with an fluoride source to control the concentration of fluoride ions and/or hydrogen fluoride within the supercritical cleaning solution. Preferably, the method and the system utilize a supercritical cleaning solution with supercritical CO2 and an ammonium fluoride salt and/or an organo-ammonium fluoride and/or amine adduct. The supercritical cleaning solution, in accordance with further embodiments, includes one or more acids and one or more carrier solvents. The supercritical cleaning solution of the present invention is capable of removing a residue, such a post-etch photo polymer residue from a semiconductor substrate material by dissolution of the reside, etching a portion of the residue, etching a portion of the substrate material or any combination thereof.
PCT/US2003/040105 2002-12-16 2003-12-16 Fluoride in supercritical fluid for photoresist and residue removal WO2004059383A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2003297212A AU2003297212A1 (en) 2002-12-16 2003-12-16 Fluoride in supercritical fluid for photoresist and residue removal

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/321,341 US20040112409A1 (en) 2002-12-16 2002-12-16 Fluoride in supercritical fluid for photoresist and residue removal
US10/321,341 2002-12-16

Publications (2)

Publication Number Publication Date
WO2004059383A2 WO2004059383A2 (en) 2004-07-15
WO2004059383A3 true WO2004059383A3 (en) 2005-02-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/040105 WO2004059383A2 (en) 2002-12-16 2003-12-16 Fluoride in supercritical fluid for photoresist and residue removal

Country Status (3)

Country Link
US (1) US20040112409A1 (en)
AU (1) AU2003297212A1 (en)
WO (1) WO2004059383A2 (en)

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Also Published As

Publication number Publication date
US20040112409A1 (en) 2004-06-17
AU2003297212A1 (en) 2004-07-22
AU2003297212A8 (en) 2004-07-22
WO2004059383A2 (en) 2004-07-15

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