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Patent

PublikationsnummerUSD592029 S1
Typ av kungörelseBeviljande
Ansökningsnummer29/295,291
Publiceringsdatum12 maj 2009
Registreringsdatum25 sep 2007
Prioritetsdatum
26 okt 2004
Även publicerat som
Uppfinnare
Ursprunglig innehavare
USA-klassificering
Externa länkar
Polishing pad
US D592029 S1
Ritningar(5)
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Anspråk
  1. The ornamental design for a polishing pad, as shown and described.

Beskrivning

FIG. 1 is a top plan view of a polishing pad showing our new design;

FIG. 2 is a front elevational view thereof, the rear elevational view, left side and right side elevational views being mirror images of the front view shown;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a partially enlarged view of portion 44 in FIG. 1;

FIG. 5 is a partially enlarged sectional view taken substantially along line 55 in FIG. 4;

FIG. 6 is a partially enlarged sectional view taken substantially along line 66 in FIG. 4;

FIG. 7 is a partially enlarged view of portion 77 in FIG. 3;

FIG. 8 is a partially enlarged sectional view of portion 8 in FIG. 5; and,

FIG. 9 is a partially enlarged view of portion 99 in FIG. 1.