US6842881B2 - Rule based system and method for automatically generating photomask orders in a specified order format - Google Patents
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- US6842881B2 US6842881B2 US10/209,254 US20925402A US6842881B2 US 6842881 B2 US6842881 B2 US 6842881B2 US 20925402 A US20925402 A US 20925402A US 6842881 B2 US6842881 B2 US 6842881B2
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
- G06Q30/00—Commerce
- G06Q30/06—Buying, selling or leasing transactions
- G06Q30/0601—Electronic shopping [e-shopping]
- G06Q30/0641—Shopping interfaces
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2111/00—Details relating to CAD techniques
- G06F2111/04—Constraint-based CAD
Definitions
- the present invention generally relates to a rule based system and method for automatically generating photomask orders in a specified format, and more particularly, relates to a software-based application which automatically generates photomask orders in a specified format through the use of templates and rules which guide a user through the process of generating a photomask order in a complete and accurate manner.
- the rules and templates are established based on the requirements of a particular standard (e.g., SEMI P10) or propriety photomask order format and are organized and stored in a manner which can be adapted to meet the criteria of both modified and new photomask order formats now known or hereinafter developed. Additionally, the system and method of the present invention provides for the ability to generate new photomask orders using existing photomask order data.
- Photomasks are high precision plates containing microscopic images of electronic circuits. Photomasks are typically made from very flat pieces of quartz or glass with a layer of chrome on one side. Etched in the chrome is a portion of an electronic circuit design. This circuit design on the mask is also called “geometry”.
- a typical photomask used in the production of semiconductor devices is formed from a “blank” or “undeveloped” photomask.
- a typical blank photomask 10 is comprised of three or four layers.
- the first layer 11 is a layer of quartz or other substantially transparent material, commonly referred to as the substrate.
- the next layer is typically a layer of opaque material 12 , such as Cr, which often includes a third layer of antireflective material 13 , such as CrO.
- the antireflective layer may or may not be included in any given photomask.
- the top layer is typically a layer of photosensitive resist material 14 .
- Other types of photomasks are also known and used including, but not limited to, phase shift masks, embedded attenuated phase shift masks (EAPSM”) and alternating aperture phase shift masks (“AAPSM”).
- the process of manufacturing a photomask involves many steps and can be time consuming.
- the desired pattern of opaque material 12 to be created on the photomask 10 is typically defined by an electronic data file loaded into an exposure system which typically scans an electron beam (E-beam) or laser beam in a raster or vector fashion across the blank photomask.
- E-beam electron beam
- a raster scan exposure system is described in U.S. Pat. No. 3,900,737 to Collier.
- Each unique exposure system has its own software and format for processing data to instruct the equipment in exposing the blank photomask.
- the exposure system directs the E-beam or laser beam at addressable locations on the photomask as defined by the electronic data file.
- the areas of the photosensitive resist material that are exposed to the E-beam or laser beam become soluble while the unexposed portions remain insoluble.
- appropriate instructions to the processing equipment need to be provided, in the form of a jobdeck.
- the soluble photosensitive resist material is removed by means well known in the art, and the unexposed, insoluble photosensitive resist material 14 ′ remains adhered to the opaque material 13 and 12 .
- the pattern to be formed on the photomask 10 is formed by the remaining photosensitive resist material 14 ′.
- the pattern is then transferred from the remaining photoresist material 14 ′ to the photomask 10 via known etch processes to remove the antireflective material 13 and opaque materials 12 in regions which are not covered by the remaining photoresist 14 ′.
- etching processes There is a wide variety of etching processes known in the art, including dry etching as well as wet etching, and thus a wide variety of equipment used to perform such etching.
- the remaining photoresist material 14 ′ is stripped or removed and the photomask is completed, as shown in FIG. 3 .
- the pattern as previously reflected by the remaining antireflective material 13 ′ and opaque materials 12 ′ are located in regions where the remaining photoresist 14 ′ remain after the soluble materials were removed in prior steps.
- a defect is any flaw affecting the geometry. This includes chrome where it should not be (chrome spots, chrome extensions, chrome bridging between geometry) or unwanted clear areas (pin holes, clear extensions, clear breaks).
- a defect can cause the customer's circuit not to function. The customer will indicate in its defect specification the size of defects that will affect their process. All defects that size and larger must be repaired, or if they can not be repaired, the mask must be rejected and rewritten.
- automated mask inspection systems such as those manufactured by KLA-Tencor or Applied Materials, are used to detect defects.
- Such automated systems direct an illumination beam at the photomask and detect the intensity of the portion of the light beam transmitted through and reflected back from the photomask. The detected light intensity is then compared with expected light intensity, and any deviation is noted as a defect.
- the details of one system can be found in U.S. Pat. No. 5,563,702 assigned to KLA-Tencor.
- a completed photomask is cleaned of contaminants.
- a pellicle may be applied to the completed photomask to protect its critical pattern region from airborne contamination. Subsequent through pellicle defect inspection may be performed. In some instances, the photomask may be cut either before or after a pellicle is applied.
- a semiconductor manufacturer e.g., customer
- a photomask manufacturer with different types of data relating to the photomask to be manufactured.
- a customer typically provides a photomask order which includes various types of information and data which are needed to manufacture and process the photomask, including, for example, data relating to the design of the photomask, materials to be used, delivery dates, billing information and other information needed to process the order and manufacture the photomask.
- a long standing problem in the manufacture of photomasks is the amount of time it takes to manufacture a photomask from the time a photomask order is received from a customer.
- the overall time it takes to process a photomask order and manufacture a photomask can be lengthy, and thus, the overall output of photomasks is not maximized.
- Part of this problem is attributable to the fact that many customers who order photomasks often place their orders in a variety of different formats which are often not compatible with the photomask manufacturer's computer system and/or manufacturing equipment.
- the photomask manufacturer is often required to reformat the order data and condition it into a different format which is compatible with its computer system and/or manufacturing equipment, which can take a great deal of time, and thus, delay the time it takes to manufacture a photomask.
- the photomask industry has developed various standard photomask order formats in which photomask orders should be placed.
- the SEMI P10 standard is one standard format used in the manufacture of photomasks.
- a few semiconductor manufacturers have developed their own proprietary photomask order format in which photomask orders are to be placed, rather than adopting a standard format.
- These standard and proprietary photomask order formats were created so that photomask orders would be received from customers in a uniform format, thereby reducing the overall time it takes to manufacture a photomask.
- the photomask manufacturer is required to parse through this data and organize it in a useful format (e.g., in the SEMI P10 format). Additionally, in those instances where incomplete photomask order data is provided to a photomask manufacturer, such manufacturer will be required to request the missing information from the customer. As a result, a great deal of time is often wasted in the process of obtaining a complete and accurate photomask order, and thus, the overall time that it takes to manufacture a photomask can be greatly delayed. There has been a long felt need in the field of photomask manufacture for a customer side system and method for automatically generating a complete and accurate photomask order in a standard and/or proprietary format.
- AlignRite Corporation attempted to expedite the delivery of the electronic data through the use of an Internet based delivery system.
- the AlignRite System was capable of rapid delivery of the photomask data from a customer to the computer system of the photomask manufacturer and was capable of validating the accuracy of this data in real time, this prior system did not provide for the automated generation of photomask order data in a single standard and/or proprietary format.
- standard modifications to the data would also have to be entered manually by operators. Each time a manual change would have to be entered, the risk of human error increased and the overall length of the job would be extended.
- the system of the DuPont PCT Publication does not prevent errors from being entered in a photomask order.
- this system is only able to identify errors in a photomask order after the order has been entered by a customer and transmitted to a photomask manufacturer.
- the photomask manufacturer validates the order information, and if it detects an error, sends an error message to the customer and prompts the customer to correct such error.
- this system does not place the entered photomask order data into a standard format until after it has been validated and received by the photomask manufacturer. In other words, the manufacturer is required to condition the data entered by a customer into a standard format for manufacturer.
- the completed photomask is sent to a customer for use to manufacture semiconductor and other products.
- photomasks are commonly used in the semiconductor industry to transfer micro-scale images defining a semiconductor circuit onto a silicon or gallium arsenide substrate or wafer.
- the process for transferring an image from a photomask to a silicon substrate or wafer is commonly referred to as lithography or microlithography.
- the semiconductor manufacturing process comprises the steps of deposition, photolithography, and etching. During deposition, a layer of either electrically insulating or electrically conductive material (like a metal, polysilicon or oxide) is deposited on the surface of a silicon wafer.
- Photolithography involves projecting the image on the photomask onto the wafer. If the image on the photomask is projected several times side by side onto the wafer, this is known as stepping and the photomask is called a reticle.
- a photomask 10 is interposed between the semiconductor wafer 20 , which includes a layer of photosensitive material, and an optical system 22 .
- Energy generated by an energy source 23 commonly referred to as a Stepper, is inhibited from passing through the areas of the photomask 10 where the opaque material is present.
- Energy from the Stepper 23 passes through the transparent portions of the quartz substrate 11 not covered by the opaque material 12 and the antireflective material 13 .
- the optical system 22 projects a scaled image 24 of the pattern of the opaque material 12 and 13 onto the semiconductor wafer 20 and causes a reaction in the photosensitive material on the semiconductor wafer.
- the solubility of the photosensitive material is changed in areas exposed to the energy. In the case of a positive photolithographic process, the exposed photosensitive material becomes soluble and can be removed. In the case of a negative photolithographic process, the exposed photosensitive material becomes insoluble and unexposed soluble photosensitive material is removed.
- the image or pattern formed in the insoluble photosensitive material is transferred to the substrate by a process well known in the art which is commonly referred to as etching. Once the pattern is etched onto the substrate material, the remaining resist is removed resulting in a finished product. A new layer of material and resist is then deposited on the wafer and the image on the next photomask is projected onto it. Again the wafer is developed and etched. This process is repeated until the circuit is complete. Because, in a typical semiconductor device many layers may be deposited, many different photomasks may be necessary for the manufacture of even a single semiconductor device.
- the system includes a server and an external data storage media stored on the server. Rules and templates for facilitating the entry of photomask order data and for generating an order are stored in the external storage media.
- the external data storage media may be a variety of different types of storage media, including, but not limited to, a relational database, an object-oriented class, an XML file and other similar storage media now known or hereinafter developed.
- the external data storage media has stored thereon at least one template for the entry and storage of photomask order data, wherein the template is created based upon the requirements of a specified photomask order format. Additionally, the external data storage media includes at least one first set of rules corresponding to the at least one template, wherein the first set of rules include instructions which ensure that a user enters complete information into the template as required by the specified order format. Additionally, the external data storage media includes at least one second set of rules which corresponds to said at least one template, wherein the second set of rules include instructions which ensure that the user enters accurate information into the template as required by the specified format.
- the system includes a graphical user interface in communication with the server, wherein the user can create and modify templates, create and modify photomask order data, access the template(s) to enter photomask order data and generate an order in a specified format.
- These orders are saved on the system and can be used by a user at a later time to create new orders based on the information saved in the order.
- FIG. 1 represents a blank or undeveloped photomask of the prior art
- FIG. 2 represents the photomask of FIG. 1 after it has been partially processed
- FIG. 3 represents the photomask of FIGS. 1 and 2 after it has been fully processed
- FIG. 4 is a flowchart showing the method of using a processed photomask to make or process a semiconductor wafer
- FIG. 5 shows the process of making a semiconductor using a wafer stepper.
- the present invention relates to a computerized rule-based system and method for automatically generating photomask orders in a specified format, wherein a photomask customer desiring to place an order for a photomask is guided through the process of entering an order in a complete and accurate manner in accordance with the requirements of the specified order format.
- the system and method utilizes the following four components to generate a photomask order into a desired format: (1) templates in which data is entered; (2) rules for converting the data entered in the templates into a specified standard and/or proprietary format; (3) a method for using templates to create a photomask order in a specified format; and (4) a separate set of rule for validating photomask order against a specified standard format.
- Software is implemented in this system to associate specific templates with specific rules to ensure that a customer enters complete and accurate photomask order information.
- software is implemented in the system of the present invention to associate specific photomask orders with specific rules to ensure that a customer enters complete and accurate photomask order information.
- the system includes a server and an external data storage media stored on the server. Rules and templates for facilitating the entry of photomask order data and for generating an order are stored in the external storage media.
- the external data storage media may be a variety of different types of storage media, including, but not limited to, a relational database, an object-oriented class, an XML file and other similar storage media now known or hereinafter developed.
- a set of templates and orders are created based on the requirements of a particular standard and/or proprietary photomask order format.
- the templates and orders are organized as a hierarchy of components and subcomponents, wherein each component and subcomponent is defined by the requirements of a particular standard and/or proprietary photomask order format.
- a particular photomask order format may require that the mask data component include certain subcomponents, such as a title, barcode and pattern data, to name a few.
- Each of these subcomponents may have further detailed subcomponents (“child component”).
- the pattern data component which is a subcomponent of the mask data component, may have a set of child components associated therewith.
- each component and subcomponent is defined by a set of attributes (e.g., binary, string, integer, real number, date, Boolean, list, etc.).
- attributes e.g., binary, string, integer, real number, date, Boolean, list, etc.
- the rules discussed in more detail below
- Table 1 demonstrates an example of how the components and subcomponents of the templates and orders may be organized according to a standard and/or proprietary photomask order format:
- each template and order is stored in a database, but may also be stored in other locations.
- a search engine may be provided on which users can search for a particular template or order stored in the database. Using the search engine, the user can locate the appropriate templates that are needed to generate a photomask in a particular order format. Once such templates are located, data relating to a photomask order is entered by a user (typically, a photomask customer desiring to place an order for a photomask). The user can also use the search engine to locate existing photomask orders for the purpose of completing the data entry or modifying their content, as described below.
- a customer may not have sufficient knowledge of the requirements of a particular photomask order format, and thus, may not enter all necessary information required by such standards to complete an order. Additionally, customers are prone to making data entry errors, and thus, may provide inaccurate information. Accordingly, a first and second set of rules are established and stored on the system to ensure that the customer enters complete and accurate data into the templates and orders, as required by a particular standard and/or proprietary photomask order format.
- the first set of rules are established to ensure that a user inputs all necessary data to output a complete photomask order, as specified by a particular standard and/or proprietary photomask order format.
- the first set of rules are established based on the requirements of a selected photomask order format.
- the first set of rules dictate whether data “must” be input, “can” be input and/or “must not” be input into each component and subcomponent of a template or order, as dictated by the specified photomask order format.
- the first set of rules should be configured such that they will require the user to enter information into any other components which are required (as set forth in a particular standard and/or proprietary photomask order format) to complete a photomask order.
- a particular standard order format may require, with respect to the “Pattern” template, that for all EAPSM orders: placement data and critical dimensions data must be provided; die to die inspection data may be provided; and die to data cannot be provided. Accordingly, rules are established and associated with the appropriate templates (and components and sub-components) which require that: 1) the user “must” include placement data and critical dimension data; 2) the user “can” include die to die inspection data; and 3) the user “must not” include die to data inspection data.
- the rules when a user seeks to create an order for an EAPSM using the system and method of the present invention, the rules will: 1) require the user to input placement and critical dimension data; 2) permit (but not require) a user to enter die to die inspection data; and 3) preclude a user from entering die to data inspection.
- the selected order format may require that in addition to Pattern Data, Array Registration data must also be entered to complete a photomask order.
- the first set of rules would also be configured such that once the user has completed entering all the pattern data, the user will be guided to the “Array Registration” template and be prompted to enter all required data into that template (and any other corresponding subcomponents of that template) as well.
- the first set of rules will guide the user to such other templates after the user has entered all data into the Array Registration template, and prompt the user to enter all required data into such template(s). Once the user has entered data in all required templates, the user will be permitted to finalize the template (subject to entering data according to the second set of rules as discussed below).
- the first set of rules of the present invention ensure that the user enters the necessary information into the appropriate templates as required by a particular standard and/or proprietary format to generate a photomask order.
- the rules guide a user through the process of entering photomask order data to ensure that all necessary order information is entered into the templates.
- the system and method also provide for a second set of rules which ensure that a user inputs data in an accurate and proper format, as specified by a particular standard and/or proprietary photomask order format.
- each component and subcomponent of a template is defined by a set of attributes (e.g., binary, string, integer, real number, date, Boolean, list, etc.).
- a second set of rules are established for each template and order that indicates to the user whether the data entered into a particular template or order “must”, “can” and/or “must not” have a particular attribute, as required by a particular standard and/or proprietary photomask order format.
- a particular standard and/or proprietary photomask order format may require that: 1) the data entered into the placement template “must” be an integer; 2) the data entered into the title template “can” be a string; and 3) the data entered into the critical dimension template “must not” be a string.
- a rule is established for the placement template which: 1) requires the user to enter an integer in the placement template; 2) allows the user to enter a string into the title template; and 3) prevents the user from entering a string into the critical dimension template.
- the rules of the present invention ensure that the user enters the appropriate type of information into each template as required by a particular standard and/or proprietary photomask order format to generate a photomask order.
- the second set of rules only permit the user to enter a certain type of data into a template, and thus, reduce the possibility of there being design errors and/or data entry errors in the process of placing a photomask order.
- the first and second set of rules described herein are created and stored separately.
- the rules may be stored either internal or external to the system in any different number of dynamic formats (e.g., as a database, an object-oriented class, an XML file, etc.) so that the system may be adapted to run on any number of platforms, depending the preferences or a user and/or automated system.
- a single set of rules can be created and stored, provided that such single set of rules both ensures that a user both enters complete photomask order information (as described with reference to the first set of rules) and enters accurate photomask order information (as described with reference to the second set of rules).
- the first and second set of rules may be combined as a single set of rules in a similar manner.
- the present invention includes a function to associate specific first and second sets of rules with specific templates, to ensure that a photomask order is generated in a complete and accurate manner.
- this functionality is provided in the form of a software-based application installed on the computer of an entity desiring to place an order for a photomask, such as a semiconductor manufacturer.
- this software is not dependent on a given photomask manufacturer's manufacturing process. Rather, the software of the present invention can be deployed as a stand-alone secure application, a network distributed application or a web-based “thin-client” application.
- the software is utilized in a client-server system, wherein a graphical user interface (e.g., the client) connects to and retrieves data from a database on the server.
- a graphical user interface e.g., the client
- the customer running the software of the present invention is not required to access and/or login to any external local area network of a photomask manufacturer to place an order.
- each element of a template is interpreted by an associated software object.
- rules are embedded within the software objects and are responsible for the assembly of the data entered in the templates. These rules are constraints or instructions, such as an algorithm, and typically relate to one or more attributes of the software object. Accordingly, with this arrangement, it is possible to enter a complete and accurate photomask order as the rules and templates are appropriately associated with each other.
- the system is preferably configured to permit the rules and templates to be separately updated should the need arise.
- the current standard photomask order format is known as the SEMI P-10 standard format.
- SEMI P-10 standard format the current standard photomask order format
- the system of the present invention provides for the ability to update the rules and templates to meet these changes. More particularly, the first and second sets of rules are preferably stored as separate files from each of the templates, which are in turn also each stored as separate files.
- system and method of the present invention is not limited to any one particular standard format, but rather can be easily adapted to conform to the requirements of any current or newly developed standard photomask order format.
- a customer may change its proprietary order format to meet any changes associated with new developments or improved technologies.
- software objects are established such that the rules contained therein may affect one or more of its attributes, its children or other rules contained within it.
- the rules are established such that only certain specified attributes are affected by rules.
- the software objects like templates, are hierarchical in nature, they know both their parent and children. Accordingly, any time a child object is modified, it notifies its parent of the area, rules or attributes impacted by the change. As a result, any change made anywhere within the hierarchy of rules is propagated through the entire family. Accordingly, the rules have the capability to enforce the addition of, or the removal of, any child element of the parent.
- each object is individually updateable through subsequent releases of the software.
- object parents maintain a standard collection for each type of child element, which can be added or removed while the template is being constructed.
- Templates can also be modified in response to a modification of a standard and/or proprietary photomask order format which requires the addition of new attributes and/or subcomponents to be added to hierarchy of orders and templates.
- the new relationships are defined for affected components and/or subcomponents and new rules are dynamically added to the existing rule schema.
- the current Semi P-10 standard requires that a photomask order include, among other things: Mask Order[ ], Mask Set [ ], Mask Definition [ ], and Pattern Definition[ ].
- the following templates would be established: SemiOrder Template, SemiMaskSet Template, SemiMask Template and SemiPattern Template.
- a first and second set of rules for each of these templates would be established which dictate whether data must be entered into each of the templates and the type of data that can be entered into such templates.
- the Semi P-10 standard may be replaced by a new standard that requires a CD component.
- the existing templates e.g., SemiPattern
- the existing templates could be modified to include, for example, a CD component to conform to a modification of the metrology aspect of the SEMI P-10 standard.
- a new template could be created to conform to any newly added aspects (e.g., registration) of the new SEMI standard.
- the already existing first and second set of rules could be adapted to meet the changes associated with the modified CD component aspect of the current SEMI P-10 standard.
- a new set of first and second set of rules could be created to conform to the new registration feature of the new SEMI standard.
- Another aspect of the present invention is that it provides for the ability to generate new photomask orders by: (1) merging data into a new order from an already existing template having data contained therein; (2) merging data into a new order from an already existing order having data contained therein; or (3) merging data into a new order from already existing templates and orders.
- a user whenever a user enters data into either a template or creates an order, such template and/or order is saved on the system of the present invention. Thereafter, a user is able to access the already existing templates and/or orders and use the data saved therein to generate a new order.
- the user is prompted to create a new, blank order.
- the user is provided with the option of selecting templates and/or orders which were created and saved from a previous photomask order.
- the user selects and loads the most relevant template(s) stored in the relational database.
- the selected template is displayed to the user with previously entered data. For each non-null object within the template (e.g., the object contains data), the user may either select the previously entered data into the new order or over-write this data with new data.
- a particular object within a template is null (e.g., it is already empty)
- the user may enter appropriate data within that object.
- the rules established for this order operate as described above to ensure that data is accurately and completely entered. Thereafter, the software processes this information and generates a new order based on this information.
- the process for creating a new order from an already existing order is similar to the process of creating a new order from an already existing template.
- the user is prompted to create a new, blank order.
- the user is provided with the option of selecting templates and/or orders which were created and saved from a previous photomask order.
- the user selects and loads the relevant order(s) stored in a relational database.
- the selected order is displayed to the user with previously entered data. For each non-null object within the order, the user may either select the previously entered data into the new order or over-write this data with new data.
- the user may enter appropriate data within that object.
- the rules established for this order operate as described above to ensure that data is accurately and completely entered. Thereafter, the software processes this information and generates a new order based on this information.
- the user is prompted to create a new, blank order.
- the user is provided with the option of selecting templates and/or orders which were created and saved from a previous photomask order.
- the user selects and loads the relevant template(s) stored in a relational database.
- the selected template is displayed to the user with previously entered data.
- the user may either select the previously entered data into the new order or over-write this data with new data.
- the user may enter appropriate data within that object.
- the rules established for this order operate as described above to ensure that data is accurately and completely entered. Additionally, previously saved orders may also be merged into the same order.
- the user can select and load previously placed order(s) stored in a relational database. The selected order is displayed to the user with previously entered data. For each non-null object within the order (e.g., the object contains data), the user may either select the previously entered data into the new order or over-write this data with new data. Additionally, to the extent that a particular object within a order is already empty, the user may enter appropriate data within that object.
- the rules established for this order operate as described above to ensure that data is accurately and completely entered. Once all of the appropriate templates and orders have been merged into the new order, the software processes this information and generates a new order based on this information.
Abstract
Description
TABLE 1 | ||||
Order | ||||
Supplied Pattern | ||||
Data | ||||
Pattern Group | ||||
Pattern | ||||
Placement | ||||
Mask Data | ||||
Title | ||||
Barcode | ||||
OPC Definition | ||||
Array | ||||
Registration | ||||
Measure File | ||||
Registration | ||||
Die to Data | ||||
Inspection | ||||
Die to Die | ||||
Inspection | ||||
Surface | ||||
Definition | ||||
Visual Inspection | ||||
Pattern | ||||
Critical | ||||
Dimension | ||||
Die to Die | ||||
Inspection | ||||
Die to Data | ||||
Inspection | ||||
Field | ||||
Pattern | ||||
Critical | ||||
Dimension | ||||
Die to Die | ||||
Inspection | ||||
Die to Data | ||||
Inspection | ||||
Claims (117)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/209,254 US6842881B2 (en) | 2002-07-30 | 2002-07-30 | Rule based system and method for automatically generating photomask orders in a specified order format |
US10/877,001 US7669167B2 (en) | 2002-07-30 | 2004-06-25 | Rule based system and method for automatically generating photomask orders by conditioning information from a customer's computer system |
US10/974,449 US20050060680A1 (en) | 2002-07-30 | 2004-10-27 | Rule based system and method for automatically generating photomask orders in a specified order format |
US10/981,201 US7640529B2 (en) | 2002-07-30 | 2004-11-03 | User-friendly rule-based system and method for automatically generating photomask orders |
EA200500694A EA008878B1 (en) | 2002-07-30 | 2005-05-20 | Rule based system and method for automatically generating photomask orders |
US11/140,004 US7356374B2 (en) | 2002-03-15 | 2005-05-27 | Comprehensive front end method and system for automatically generating and processing photomask orders |
EA200500760A EA009013B1 (en) | 2002-07-30 | 2005-06-01 | Comprehensive front end method and system for automatically generating and processing photomask orders |
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US10/209,254 US6842881B2 (en) | 2002-07-30 | 2002-07-30 | Rule based system and method for automatically generating photomask orders in a specified order format |
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US10/974,449 Continuation US20050060680A1 (en) | 2002-07-30 | 2004-10-27 | Rule based system and method for automatically generating photomask orders in a specified order format |
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US20040025137A1 US20040025137A1 (en) | 2004-02-05 |
US6842881B2 true US6842881B2 (en) | 2005-01-11 |
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US10/209,254 Expired - Lifetime US6842881B2 (en) | 2002-03-15 | 2002-07-30 | Rule based system and method for automatically generating photomask orders in a specified order format |
US10/974,449 Abandoned US20050060680A1 (en) | 2002-07-30 | 2004-10-27 | Rule based system and method for automatically generating photomask orders in a specified order format |
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US10/974,449 Abandoned US20050060680A1 (en) | 2002-07-30 | 2004-10-27 | Rule based system and method for automatically generating photomask orders in a specified order format |
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US20030182167A1 (en) * | 2002-03-21 | 2003-09-25 | Wolfgang Kalthoff | Goal management |
US8499036B2 (en) | 2002-03-21 | 2013-07-30 | Sap Ag | Collaborative design process |
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US20040044689A1 (en) * | 2002-09-03 | 2004-03-04 | Markus Krabel | Central master data management |
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US20040117377A1 (en) * | 2002-10-16 | 2004-06-17 | Gerd Moser | Master data access |
US9256655B2 (en) | 2002-10-16 | 2016-02-09 | Sap Se | Dynamic access of data |
US8438238B2 (en) | 2002-10-16 | 2013-05-07 | Sap Ag | Master data access |
US20040103103A1 (en) * | 2002-11-27 | 2004-05-27 | Wolfgang Kalthoff | Collaborative master data management |
US20040103182A1 (en) * | 2002-11-27 | 2004-05-27 | Markus Krabel | Distribution in master data management |
US8180732B2 (en) | 2002-11-27 | 2012-05-15 | Sap Ag | Distributing data in master data management systems |
US7236973B2 (en) | 2002-11-27 | 2007-06-26 | Sap Aktiengesellschaft | Collaborative master data management system for identifying similar objects including identical and non-identical attributes |
US9691053B1 (en) | 2003-02-13 | 2017-06-27 | Sap Se | System and method of master data management |
US8061604B1 (en) | 2003-02-13 | 2011-11-22 | Sap Ag | System and method of master data management using RFID technology |
US20040181458A1 (en) * | 2003-03-14 | 2004-09-16 | Danchai Kochpatcharin | System, apparatus and method for reticle grade and pricing management |
US7363236B2 (en) | 2003-03-14 | 2008-04-22 | Chartered Semiconductor Manufacturing Ltd. | System, apparatus and method for reticle grade and pricing management |
US7069533B2 (en) * | 2003-03-14 | 2006-06-27 | Chatered Semiconductor Manufacturing, Ltd | System, apparatus and method for automated tapeout support |
US20040181769A1 (en) * | 2003-03-14 | 2004-09-16 | Danchai Kochpatcharin | System, apparatus and method for automated tapeout support |
US7930149B2 (en) | 2003-12-19 | 2011-04-19 | Sap Aktiengesellschaft | Versioning of elements in a configuration model |
US20050137731A1 (en) * | 2003-12-19 | 2005-06-23 | Albert Haag | Versioning of elements in a configuration model |
US7272776B2 (en) * | 2003-12-30 | 2007-09-18 | Sap Aktiengesellschaft | Master data quality |
US20050149474A1 (en) * | 2003-12-30 | 2005-07-07 | Wolfgang Kalthoff | Master data entry |
US20050144552A1 (en) * | 2003-12-30 | 2005-06-30 | Wolfgang Kalthoff | Master data quality |
US20060026549A1 (en) * | 2004-07-27 | 2006-02-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and system for conducting an online transaction of multi-project wafer service |
US20230177772A1 (en) * | 2021-12-06 | 2023-06-08 | Dillon Edward Thompson | Rules of interaction of the 3D Golden Rhombus |
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