Sök Bilder Kartor Play YouTube Nyheter Gmail Drive Mer »
Avancerad patentsökning | Webbhistorik | Logga in

Patent

Hänvisningar finns i följande patent

citeras i Registreringsdatum Utfärdandedatum Ursprunglig innehavare Titel
US419001914 sep 197726 feb 1980Vacuum metallizing interior of hollow article with masking shield
US41911287 nov 19784 mar 1980Vacuum metallizing of hollow articles
US450040719 jul 198319 feb 1985Varian Associates, Inc.Disk or wafer handling and coating system
US463734226 feb 198520 jan 1987Canon Kabushiki KaishaVacuum processing apparatus
US46667345 maj 198319 maj 1987Canon Kabushiki KaishaApparatus and process for mass production of film by vacuum deposition
US475681521 dec 197912 jul 1988Varian Associates, Inc.Wafer coating system
US479705413 jun 198610 jan 1989Fujitsu LimitedApparatus for loading and unloading a vacuum processing chamber
US48201062 sep 198711 apr 1989Leybold-Heraeus GmbHApparatus for passing workpieces into and out of a coating chamber through locks
US495160312 sep 198828 aug 1990Daidousanso Co., Ltd.Apparatus for producing semiconductors
US500201018 okt 198926 mar 1991Varian Associates, Inc.Vacuum vessel
US50247471 jun 198818 jun 1991Varian Associates, Inc.Wafer coating system
US511246927 aug 199012 maj 1992Leybold AktiengesellschaftApparatus for the inward and outward transfer of a workpiece in a vacuum chamber
US518354719 apr 19912 feb 1993Sony CorporationSputtering apparatus and system for sputtering employing same
US51905908 apr 19912 mar 1993Matsushita Electric Industrial Co., Ltd.Vacuum coating apparatus
US524573626 maj 199221 sep 1993Balzers AktiengesellschaftVacuum process apparatus
US52599425 jun 19929 nov 1993Leybold AktiengesellschaftDevice for transferring a workpiece into and out from a vacuum chamber
US52813204 apr 199125 jan 1994Varian Associates Inc.Wafer coating system
US55036757 dec 19932 apr 1996Leybold AktiengesellschaftApparatus for applying a mask to and/or removing it from a substrate
US553856026 jul 199423 jul 1996Leybold AktiengesellschaftVacuum coating apparatus
US57730885 dec 199530 jun 1998Materials Research Group, Inc.Treatment system including vacuum isolated sources and method
US58490871 jul 199715 dec 1998Leybold Systems GmbHVacuum treatment system for applying thin layers to substrates such as headlights reflectors
US609623125 jan 19991 aug 2000Balzers AktiengesellschaftChamber, at least for the transport of workpieces, a chamber combination, a vacuum treatment facility as well as a transport method
US611374912 apr 19965 sep 2000Odme International B.V.Sputtering method in multi-chambered device
US61938042 okt 199927 feb 2001Taiwan Semiconductor Manufacturing Company, LtdApparatus and method for sealing a vacuum chamber
US620367728 sep 199820 mar 2001Leybold Systems GmbHSputtering device for coating an essentially flat disk-shaped substrate
US626480412 apr 200024 jul 2001SKE Technology Corp.System and method for handling and masking a substrate in a sputter deposition system
US640659825 maj 200118 jun 2002STEAG HamaTech AGSystem and method for transporting and sputter coating a substrate in a sputter deposition system
US641338112 apr 20002 jul 2002Steag HamaTech AGHorizontal sputtering system
US655498016 okt 199729 apr 2003Leybold Optics GmbHVacuum treatment apparatus for deposition of thin layers on three-dimensional substrates
US662025229 okt 200116 sep 2003Thomson Licensing S.A.Metallization module for cathode-ray tube (CRT) applications
US679373527 dec 200021 sep 2004International Business Machines CorporationIntegrated cobalt silicide process for semiconductor devices
US681810817 jul 200116 nov 2004Unaxis Balzers AktiengesellschaftChamber for the transport of workpieces in a vacuum atmosphere, a chamber combination and a method for transporting a workpiece
USRE401913 nov 19971 apr 2008OC Oerlikon Balzers AGVacuum process apparatus
USRE4019219 jul 20001 apr 2008OC Oerlikon Balzers AGVacuum process apparatus

Ritningar