|
| US4033287 | 22 jan 1976 | 5 jul 1977 | Bell Telephone Laboratories, Incorporated | Radial flow reactor including glow discharge limiting shield |
| US4066037 | 17 dec 1975 | 3 jan 1978 | LFE Corportion | Apparatus for depositing dielectric films using a glow discharge |
| US4142004 | 22 jan 1976 | 27 feb 1979 | Bell Telephone Laboratories, Incorporated | Method of coating semiconductor substrates |
| US4207137 | 13 apr 1979 | 10 jun 1980 | Bell Telephone Laboratories, Incorporated | Method of controlling a plasma etching process by monitoring the impedance changes of the RF power |
| US4262631 | 1 okt 1979 | 21 apr 1981 | | Thin film deposition apparatus using an RF glow discharge |
| US4275289 | 4 feb 1980 | 23 jun 1981 | Western Electric Company, Inc. | Uniformly cooled plasma etching electrode |
| US4289797 | 11 okt 1979 | 15 sep 1981 | Western Electric Co., Incorporated | Method of depositing uniform films of Si.sub.x N.sub.y or Si.sub.x O.sub.y in a plasma reactor |
| US4361749 | 3 nov 1980 | 30 nov 1982 | Western Electric Co., Inc. | Uniformly cooled plasma etching electrode |
| US4421786 | 1 jun 1982 | 20 dec 1983 | Western Electric Co. | Chemical vapor deposition reactor for silicon epitaxial processes |
| US4461237 | 17 mar 1983 | 24 jul 1984 | International Business Machines Corporation | Plasma reactor for etching and coating substrates |
| US4492610 | 12 dec 1983 | 8 jan 1985 | Tokyo Shibaura Denki Kabushiki Kaisha | Dry Etching method and device therefor |
| US4534826 | 29 dec 1983 | 13 aug 1985 | IBM Corporation | Trench etch process for dielectric isolation |
| US4585668 | 16 aug 1984 | 29 apr 1986 | Michigan State University | Method for treating a surface with a microwave or UHF plasma and improved apparatus |
| US4603056 | 25 apr 1985 | 29 jul 1986 | International Business Machines Corporation | Surface treatment of a molybdenum screening mask |
| US4630566 | 15 nov 1985 | 23 dec 1986 | Board of Trustees operating Michigan State University | Microwave or UHF plasma improved apparatus |
| US4654106 | 22 okt 1984 | 31 mar 1987 | Texas Instruments Incorporated | Automated plasma reactor |
| US4657617 | 22 okt 1984 | 14 apr 1987 | Texas Instruments Incorporated | Anodized aluminum substrate for plasma etch reactor |
| US4657618 | 22 okt 1984 | 14 apr 1987 | Texas Instruments Incorporated | Powered load lock electrode/substrate assembly including robot arm, optimized for plasma process uniformity and rate |
| US4657620 | 22 okt 1984 | 14 apr 1987 | Texas Instruments Incorporated | Automated single slice powered load lock plasma reactor |
| US4657621 | 22 okt 1984 | 14 apr 1987 | Texas Instruments Incorporated | Low particulate vacuum chamber input/output valve |
| US4659413 | 24 okt 1984 | 21 apr 1987 | Texas Instruments Incorporated | Automated single slice cassette load lock plasma reactor |
| US4661196 | 22 okt 1984 | 28 apr 1987 | Texas Instruments Incorporated | Plasma etch movable substrate |
| US4686111 | 13 feb 1984 | 11 aug 1987 | Motorola, Inc. | Passivated and low scatter acoustic wave devices and method thereof |
| US4708766 | 7 nov 1986 | 24 nov 1987 | Texas Instruments Incorporated | Hydrogen iodide etch of tin oxide |
| US4801427 | 25 feb 1987 | 31 jan 1989 | Adir Jacob | Process and apparatus for dry sterilization of medical devices and materials |
| US4807004 | 26 nov 1986 | 21 feb 1989 | Texas Instruments Incorporated | Tin oxide CCD imager |
| US4818488 | 14 jul 1987 | 4 apr 1989 | | Process and apparatus for dry sterilization of medical devices and materials |
| US4834022 | 27 okt 1987 | 30 maj 1989 | Focus Semiconductor Systems, Inc. | CVD reactor and gas injection system |
| US4885074 | 26 apr 1989 | 5 dec 1989 | International Business Machines Corporation | Plasma reactor having segmented electrodes |
| US4917586 | 22 nov 1988 | 17 apr 1990 | | Process for dry sterilization of medical devices and materials |
| US4931261 | 22 nov 1988 | 5 jun 1990 | | Apparatus for dry sterilization of medical devices and materials |
| US4943417 | 22 nov 1988 | 24 jul 1990 | | Apparatus for dry sterilization of medical devices and materials |
| US4976920 | 31 mar 1989 | 11 dec 1990 | | Process for dry sterilization of medical devices and materials |
| US4976996 | 17 feb 1987 | 11 dec 1990 | Lam Research Corporation | Chemical vapor deposition reactor and method of use thereof |
| US4993358 | 28 jul 1989 | 19 feb 1991 | Watkins-Johnson Company | Chemical vapor deposition reactor and method of operation |
| US5087418 | 31 aug 1990 | 11 feb 1992 | | Process for dry sterilization of medical devices and materials |
| US5171525 | 3 aug 1990 | 15 dec 1992 | | Process and apparatus for dry sterilization of medical devices and materials |
| US5200158 | 19 sep 1991 | 6 apr 1993 | | Process and apparatus for dry sterilization of medical devices and materials |
| US5522935 | 1 mar 1993 | 4 jun 1996 | NEC Corporation | Plasma CVD apparatus for manufacturing a semiconductor device |
| US5902407 | 10 aug 1995 | 11 maj 1999 | | Rotatable substrate supporting mechanism with temperature sensing device for use in chemical vapor deposition equipment |
| US6002109 | 10 jul 1995 | 14 dec 1999 | Mattson Technology, Inc. | System and method for thermal processing of a semiconductor substrate |
| US6074519 | 3 sep 1999 | 13 jun 2000 | Samsung Electronics Co., Ltd. | Plasma etching apparatus having a sealing member coupling an upper electrode to an etching chamber |
| US6403925 | 25 okt 2000 | 11 jun 2002 | Mattson Technology, Inc. | System and method for thermal processing of a semiconductor substrate |
| US6995545 | 18 aug 2003 | 7 feb 2006 | MKS Instruments, Inc. | Control system for a sputtering system |
| US7294207 | 24 mar 2003 | 13 nov 2007 | Aixtron AG | Gas-admission element for CVD processes, and device |
| US7641939 | 31 okt 2007 | 5 jan 2010 | Bridgelux, Inc. | Chemical vapor deposition reactor having multiple inlets |
| US7709398 | 31 okt 2005 | 4 maj 2010 | Aixtron AG | Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned |
| US7897495 | 12 dec 2006 | 1 mar 2011 | Applied Materials, Inc. | Formation of epitaxial layer containing silicon and carbon |
| US7999210 | 26 feb 2003 | 16 aug 2011 | Sumitomo Electric Industries, Ltd. | Heating device for manufacturing semiconductor |
| US8216375 | 26 apr 2007 | 10 jul 2012 | Bridgelux, Inc. | Slab cross flow CVD reactor |
| US8216419 | 30 jun 2008 | 10 jul 2012 | Bridgelux, Inc. | Drilled CVD shower head |
| USRE30244 | 28 sep 1978 | 1 apr 1980 | Bell Telephone Laboratories, Incorporated | Radial flow reactor including glow discharge limitting shield |