US20050104055A1 - Transistor of semiconductor device, and method for manufacturing the same - Google Patents
Transistor of semiconductor device, and method for manufacturing the same Download PDFInfo
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- US20050104055A1 US20050104055A1 US11/018,350 US1835004A US2005104055A1 US 20050104055 A1 US20050104055 A1 US 20050104055A1 US 1835004 A US1835004 A US 1835004A US 2005104055 A1 US2005104055 A1 US 2005104055A1
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 title abstract description 59
- 238000004519 manufacturing process Methods 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims description 21
- 238000002955 isolation Methods 0.000 claims description 13
- 150000004767 nitrides Chemical class 0.000 claims description 11
- 239000010410 layer Substances 0.000 description 79
- 230000008569 process Effects 0.000 description 43
- 239000007943 implant Substances 0.000 description 11
- 238000005530 etching Methods 0.000 description 10
- 239000012535 impurity Substances 0.000 description 10
- 238000001039 wet etching Methods 0.000 description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000010354 integration Effects 0.000 description 6
- 229910003818 SiH2Cl2 Inorganic materials 0.000 description 5
- 238000001259 photo etching Methods 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 229920005591 polysilicon Polymers 0.000 description 5
- 238000000231 atomic layer deposition Methods 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- QUZPNFFHZPRKJD-UHFFFAOYSA-N germane Chemical compound [GeH4] QUZPNFFHZPRKJD-UHFFFAOYSA-N 0.000 description 2
- 229910052986 germanium hydride Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66651—Lateral single gate silicon transistors with a single crystalline channel formed on the silicon substrate after insulating device isolation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
- H01L29/0649—Dielectric regions, e.g. SiO2 regions, air gaps
- H01L29/0653—Dielectric regions, e.g. SiO2 regions, air gaps adjoining the input or output region of a field-effect device, e.g. the source or drain region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66545—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66613—Lateral single gate silicon transistors with a gate recessing step, e.g. using local oxidation
- H01L29/66621—Lateral single gate silicon transistors with a gate recessing step, e.g. using local oxidation using etching to form a recess at the gate location
Definitions
- the present invention relates to transistor of semiconductor device and method for manufacturing the same, and more particularly to improved transistor of memory device and method for manufacturing the same which provides a high speed and high integrated device by preventing deterioration of the characteristics of the device resulting from increase of impurity concentration as the integration of the device is increased.
- the concentration of impurities implanted into a substrate must be increased to minimize short channel effects, threshold voltages and leakage currents.
- the increase of the concentration of impurities results in increase of junction electric intensity, which generates short channel effects and leakage currents.
- the increase of concentration increases junction capacitance, thereby reducing the operation speed of the device.
- the characteristics of the device is degradeddue to the increased concentration of impurities implanted into the substrate, thereby making the achievement of the high operation speed and high integration of the semiconductor device more difficult.
- a transistor of a semiconductor device comprising: an epitaxial channel region disposed on an active region of a semiconductor substrate; a stacked structure of an insulating film and an epitaxial source/drain junction layer disposed at both sides of the channel region; and a stacked structure of a gate insulating film and a gate electrode disposed on the epitaxial channel region, wherein at least a portion of the gate insulating film overlap with the source/drain junction layer is provided.
- a method for forming a transistor of a semiconductor device comprising the steps of: forming a stacked structure of a first epitaxial layer and a second epitaxial layer on a semiconductor substrate; forming a device isolation film of trench type defining an active region, wherein a thickness of the device isolation film is substantially the same as that of the stacked structure; implanting an impurity into the second epitaxial layer using the device isolation film as a mask; sequentially forming a thermal oxide film and a sacrificial film on the entire surface of the resulting structure; etching the sacrificial film, the thermal oxide film, and the second and first epitaxial layers using a gate electrode mask to form an opening exposing the semiconductor substrate; removing the first epitaxial layer to form an under-cut under the second epitaxial layer; forming an insulating film filling the under-cut; growing a third epitaxial layer on the semiconductor substrate exposed by the opening; removing the sacrificial film and the thermal oxide
- a method for forming a transistor of a semiconductor device comprising the steps of: forming a stacked structure of a first epitaxial layer and a second epitaxial layer on a semiconductor substrate; forming a device isolation film of trench type defining an active region; forming a dummy gate electrode on the second epitaxial layer; implanting an impurity into the second epitaxial layer using the dummy gate electrode as a mask; forming an insulating film spacer at a sidewall of the dummy gate; forming a thermal oxide film on the entire surface of the resulting structure; forming a planarized interlayer insulating film exposing the top surface of the dummy gate; etching the dummy gate and the second and first epitaxial layers therebelow to form an opening exposing the semiconductor substrate; removing the first epitaxial layer to form an under-cut under the second epitaxial layer; forming an insulating film filling the under-cut; growing a third epitaxial layer having
- FIG. 1 is a layout diagram illustrating an active region and a gate region formed in one field
- FIGS. 2 a to 2 f are cross-sectional diagrams illustrating sequential steps of a method for forming a transistor of a semiconductor device in accordance with a first embodiment of the present invention.
- FIGS. 3 a to 3 i are cross-sectional diagrams illustrating sequential steps of a method for forming a transistor of a semiconductor device in accordance with a second embodiment of the present invention.
- FIG. 1 is a layout diagram illustrating an active region and a gate electrode region 22 formed on a semiconductor substrate 11
- FIGS. 2 a to 2 f are cross-sectional diagrams illustrating sequential steps of a method for forming a transistor of a semiconductor device in accordance with a first embodiment of the present invention, taken along lines I-I of FIG. 1 .
- an first epitaxial layer 13 and a conductive second epitaxial layer 15 are sequentially formed on the semiconductor substrate 11 consisting of silicon.
- the first epitaxial layer 13 is an epitaxial SiGe layer formed under an atmosphere of a mixture gas of a gas from the group consisting of GeH 4 , SiH 4 , SiH 2 Cl 2 and combinations thereof, HCl and H 2 , and has a thickness ranging from 50 to 1000 ⁇
- the second epitaxial layer 15 is an epitaxial Si layer formed under an atmosphere of a gas from the group consisting of SiH 4 , SiH 2 Cl 2 and combinations thereof, HCl and H 2 , and has a thickness ranging from 50 to 1000 ⁇ .
- a pad oxide film (not shown) and a nitride film (not shown) are sequentially formed on the entire surface of the resulting structure.
- the nitride film, the oxide film, the second epitaxial layer 15 , the first epitaxial layer 13 and a predetermined depth of semiconductor substrate 11 are etched via a photoetching process using a device isolation mask (not shown) to form a trench.
- a device isolation film 17 is formed by filling the trench to define an active region.
- the second epitaxial layer 15 is subjected to an implant process using the device isolation film 17 as a mask.
- the implant process is preferably performed using As having a concentration ranging from 1.0 E12 to 5.0 E13 atoms/cm 2 with an energy ranging from 10 to 100 KeV. Other conventional impurities may be used.
- a thermal oxide film 19 is formed on the entire surface of the resulting structure.
- the thermal oxide film preferably has a thickness ranging from 10 to 200 ⁇ .
- a sacrificial film 21 is then formed on the thermal oxide film 19 .
- the sacrificial film 21 may be an oxide film, nitride film or polysilicon film having a thickness ranging from 500 to 3000 ⁇ and used as a mask.
- a gate electrode region 22 exposing the semiconductor substrate 11 is formed by sequentially etching the sacrificial film 21 , the thermal oxide film 19 , the second epitaxial layer 15 and the first epitaxial layer 13 via a photoetching process using a mask exposing an region corresponding to the gate electrode region 22 of FIG. 1 .
- the first epitaxial layer 13 exposed by a lower sidewall of the gate electrode region 22 is removed to form an under-cut 23 under the second epitaxial layer 15 .
- the process for removing the exposed portion of the first epitaxial layer 13 is a wet etching process or an isotropic dry etching process utilizing etching selectivity differences among adjacent layers and the first epitaxial layer 13 .
- the wet etching process is preferably performed using a solution containing H 2 O, H 2 O 2 and NH 4 OH having a ratio of 5:1:1 at a temperature ranging from 70 to 80° C. (ref. F. S. Johnson et al. journal of electronic materials, vol 21, p. 805-810, 1992).
- the isotropic dry etching process is preferably a plasma etching process using HBr, O 2 and Cl 2 , and more preferably performed using microwaves to improve isotropic etching properties.
- the plasma etching process may be performed using SF 6 .
- an insulating film 25 for filling the under-cut 23 is formed on the entire surface of the resulting structure.
- the insulating film 25 is an oxide film or nitride film.
- the insulating film 25 is preferably formed via thermal oxidation, chemical vapor deposition (CVD) or atomic layer deposition (ALD).
- the CVD process is performed using SiH 4 and N 2 O under a pressure of 50 Torr and at a temperature ranging from 50 to 800° C.
- the thermal oxidation process is a dry or wet process performed at a temperature of 700 to 1100° C.
- a wet etching process is performed so that only the portion of the insulating film 25 in the under-cut 23 remains.
- the wet etching process is preferably performed using a HF group etching solution.
- a third epitaxial layer 27 is grown on the semiconductor substrate 11 exposed by the gate electrode region 22 .
- the third epitaxial layer 27 is an epitaxial Si layer having a thickness ranging from 100 to 2000 ⁇ formed under an atmosphere of a mixture gas of a gas from the group consisting of SiH 4 , SiH 2 Cl 2 and combinations thereof, HCl and H 2 .
- the sacrificial oxide film 21 and the thermal oxide film 19 are removed via a wet etching process.
- the wet etching process is performed by utilizing the etching selectivity difference among adjacent other layers and the sacrificial oxide film 21 .
- a channel region is formed on the third epitaxial layer 27 by performing a channel implant process and a punch stop implant process.
- a gate electrode having a stacked structure of a gate oxide film 29 , a conductive layer for gate electrode 31 and a hard mask layer 33 is formed via a photoetching process using a gate electrode mask.
- Conventional conductive materials may be used as the conductive layer for gate electrode 31 .
- the hard mask layer 33 is preferably a nitride film or an oxide film.
- the formation of the channel region and removal of the sacrificial oxide film 21 and the thermal oxide film 19 may be performed prior to the formation of the gate electrode.
- the conductive third epitaxial layer 27 formed in the active region of the semiconductor substrate 11 corresponds to the channel region of the transistor.
- the stacked structure of the insulating film 25 and the conductive second epitaxial layer 15 is formed at both sides of the third epitaxial layer 27 , and the gate insulating film 29 and the gate electrode 31 are formed on the third epitaxial layer 27 .
- the second epitaxial layer 15 corresponds to a source/drain junction layer, and at least a portion of the gate insulating film 29 overlap with the second epitaxial layer 15 .
- FIGS. 3 a to 3 i are cross-sectional diagrams illustrating sequential steps of a method for forming a transistor of a semiconductor device in accordance with a second embodiment of the present invention, taken along lines I-I of FIG. 1 .
- an first epitaxial layer 43 and a conductive second epitaxial layer 45 are sequentially formed on the semiconductor substrate 41 comprised of silicon.
- the first epitaxial layer 43 is an epitaxial SiGe layer having a thickness ranging from 50 to 1000 ⁇ formed under an atmosphere of a mixture gas of a gas from the group consisting of GeH 4 , SiH 4 , SiH 2 Cl 2 and combinations thereof, HCl and H 2
- 45 is an epitaxial Si layer having a thickness ranging from 50 to 1000 ⁇ formed under an atmosphere of a mixture gas of a gas from the group consisting of SiH 4 , SiH 2 Cl 2 and combinations thereof, HCl and H 2 .
- a pad oxide film (not shown) and a nitride film (not shown) are sequentially formed on the entire surface of the resulting structure.
- the nitride film, the oxide film, the second epitaxial layer 45 , the first epitaxial layer 43 and a predetermined depth of semiconductor substrate 41 are etched via a photoetching process using a device isolation mask (not shown) to form a trench.
- a device isolation film 47 is formed by filling the trench to define an active region.
- a polysilicon layer (not shown) is formed on the entire surface of the resulting structure., and then etched via a photoetching process using a gate electrode mask to form a dummy gate electrode 49 in a predetermined region where a gate electrode region is to be formed.
- the thickness of the polysilicon layer is substantially the same as that of the gate electrode formed in a subsequent process, for example, 500 to 3000 ⁇ in thickness.
- An oxide film or nitride film may be used other than the polysilicon layer.
- the second epitaxial layer 45 is subjected to an implant process using the dummy gate electrode 49 as a mask.
- the implant process is preferably performed using As having a concentration ranging from 1.0 E12 to 5.0 E13 atoms/cm 2 with an energy ranging from 10 to 100 KeV. Other conventional impurities may be used.
- the implant process may also be performed prior to the formation of the polysilicon layer using the device isolation film 47 as a mask.
- an insulating film spacer 51 preferably a nitride film or an oxide film is formed at sidewalls of the dummy gate electrode 49 .
- a thermal oxide film 53 is then formed on the entire surface of the resulting structure.
- an interlayer insulating film 55 is formed on the entire surface of the resulting structure, and then planarized to expose the top surface of the dummy gate electrode 49 .
- the planarization process is a CMP process.
- the exposed dummy gate electrode 49 is first removed, and the second epitaxial layer 45 and the first epitaxial layer 43 are etched using the interlayer insulating film 55 and the insulating film spacer 51 as a mask to form a gate electrode region 57 exposing the semiconductor substrate 41 .
- the first epitaxial layer 43 exposed by a lower sidewall of the gate electrode region 57 is removed to form an under-cut 59 under the second epitaxial layer 45 .
- the process for removing the exposed portion of the first epitaxial layer 43 is a wet etching process or an isotropic dry etching process utilizing etching selectivity differences among adjacent and the first signal-crystalline layer 43 .
- the wet etching process is preferably performed using a solution containing H 2 O, H 2 O 2 , NH 4 OH having a ratio of 5:1:1 at a temperature ranging from 70 to 80° C. (ref. F. S. Johnson et al. journal of electronic materials, vol 21, p. 805-810, 1992).
- the isotropic dry etching process is preferably a plasma etching process using HBr, O 2 and Cl 2 , and more preferably performed using microwaves to improve isotropic etching properties.
- the plasma etching process may be performed using SF 6 .
- an insulating film 61 for filling the under-cut 59 is formed on the entire surface of the resulting structure.
- the insulating film 61 is an oxide film or a nitride film.
- the insulating film 61 is preferably formed via thermal oxidation, chemical vapor deposition (CVD) or atomic layer deposition (ALD).
- the CVD process is performed using SiH 4 and N 2 O under a pressure of 50 Torr and at a temperature ranging from 50 to 800° C.
- the thermal oxidation process is a dry or wet process performed at a temperature ranging from 700 to 1100° C.
- a wet etching process is performed so that only the portion of the insulating film 61 in the under-cut 59 remains.
- the wet etching process is preferably performed using a HF group etching solution.
- a third epitaxial layer 63 which is preferably an epitaxial Si layer having a thickness ranging from 100 to 2000 ⁇ , is grown on the semiconductor substrate 41 exposed by the gate electrode region 57 .
- a channel region is formed on the third epitaxial layer 63 by performing a channel implant process and a punch stop implant process.
- a gate oxide film 65 is grown on the third epitaxial layer 63 , and a conductive layer for gate electrode 67 is formed on the gate oxide film 65 , and then planarized using the interlayer insulating film 55 as an etch barrier to form a gate electrode.
- the gate electrode may include a stacked structure of a conductive layer and a hard mask layer.
- the transistor of the semiconductor device and the method for forming the same have the following advantages:
- the epitaxial Si layer consisting the source/drain junction region represses depletion in a bulk-wise direction to improve punch-through characteristics and allows a reduction of the dose of punch stop implant to improve refresh characteristics of the DRAM.
- the improved punch-through characteristics allow reduction of channel threshold voltage control implant dose, thereby improving swing phenomenon and leakage current characteristics in an off state.
- junction breakdown voltage allows a high-speed operation of the device which uses a high driving voltage.
- the epitaxial channel region and the source/drain junction region provide an improved interface characteristics of the semiconductor substrate.
Abstract
A semiconductor device and a method for forming the same are disclosed. The semiconductor device includes an epitaxial source/drain junction layer having an insulating film thereunder. The method comprises the step of forming a under-cut under an epitaxial source/drain junction layer so that an insulating film filling the under-cut can be formed.
Description
- 1. Field of the Invention
- The present invention relates to transistor of semiconductor device and method for manufacturing the same, and more particularly to improved transistor of memory device and method for manufacturing the same which provides a high speed and high integrated device by preventing deterioration of the characteristics of the device resulting from increase of impurity concentration as the integration of the device is increased.
- 2. Description of the Background Art
- As the integration of a semiconductor device has been increased, integration of a DRAM has increased. However, the refresh time of the DRAM is almost double in each generation because of a high speed and low power requirements.
- As the density of a memory device continuously increases, the concentration of impurities implanted into a substrate must be increased to minimize short channel effects, threshold voltages and leakage currents. However, the increase of the concentration of impurities results in increase of junction electric intensity, which generates short channel effects and leakage currents.
- Moreover, the increase of concentration increases junction capacitance, thereby reducing the operation speed of the device.
- As described above, in the conventional transistor of the semiconductor device and a method for manufacturing the same, the characteristics of the device is degradeddue to the increased concentration of impurities implanted into the substrate, thereby making the achievement of the high operation speed and high integration of the semiconductor device more difficult.
- Accordingly, it is an object of the present invention to provide a transistor of a semiconductor device and a method for forming the same wherein capacitance generated by junction leakage current and junction depletion in a source/drain junction layer is remove to achieve a high speed and high integration of the device.
- According to one aspect of the present invention, a transistor of a semiconductor device, comprising: an epitaxial channel region disposed on an active region of a semiconductor substrate; a stacked structure of an insulating film and an epitaxial source/drain junction layer disposed at both sides of the channel region; and a stacked structure of a gate insulating film and a gate electrode disposed on the epitaxial channel region, wherein at least a portion of the gate insulating film overlap with the source/drain junction layer is provided.
- According to another aspect of the invention, a method for forming a transistor of a semiconductor device., comprising the steps of: forming a stacked structure of a first epitaxial layer and a second epitaxial layer on a semiconductor substrate; forming a device isolation film of trench type defining an active region, wherein a thickness of the device isolation film is substantially the same as that of the stacked structure; implanting an impurity into the second epitaxial layer using the device isolation film as a mask; sequentially forming a thermal oxide film and a sacrificial film on the entire surface of the resulting structure; etching the sacrificial film, the thermal oxide film, and the second and first epitaxial layers using a gate electrode mask to form an opening exposing the semiconductor substrate; removing the first epitaxial layer to form an under-cut under the second epitaxial layer; forming an insulating film filling the under-cut; growing a third epitaxial layer on the semiconductor substrate exposed by the opening; removing the sacrificial film and the thermal oxide film; implanting an impurity into the third epitaxial layer to form a channel region; and forming a gate electrode on the channel region is provided.
- According to yet another aspect of the invention, a method for forming a transistor of a semiconductor device, comprising the steps of: forming a stacked structure of a first epitaxial layer and a second epitaxial layer on a semiconductor substrate; forming a device isolation film of trench type defining an active region; forming a dummy gate electrode on the second epitaxial layer; implanting an impurity into the second epitaxial layer using the dummy gate electrode as a mask; forming an insulating film spacer at a sidewall of the dummy gate; forming a thermal oxide film on the entire surface of the resulting structure; forming a planarized interlayer insulating film exposing the top surface of the dummy gate; etching the dummy gate and the second and first epitaxial layers therebelow to form an opening exposing the semiconductor substrate; removing the first epitaxial layer to form an under-cut under the second epitaxial layer; forming an insulating film filling the under-cut; growing a third epitaxial layer having an impurity implanted therein on the semiconductor substrate exposed by the opening; and forming a stacked structure of a gate oxide film and a gate electrode on the third epitaxial layer is provided.
- The present invention will become better understood with reference to the accompanying drawings which are given only by way of illustration and thus are not limitative of the present invention, wherein:
-
FIG. 1 is a layout diagram illustrating an active region and a gate region formed in one field; -
FIGS. 2 a to 2 f are cross-sectional diagrams illustrating sequential steps of a method for forming a transistor of a semiconductor device in accordance with a first embodiment of the present invention; and -
FIGS. 3 a to 3 i are cross-sectional diagrams illustrating sequential steps of a method for forming a transistor of a semiconductor device in accordance with a second embodiment of the present invention. - A transistor of a semiconductor device and a method for forming the same in accordance with preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings.
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FIG. 1 is a layout diagram illustrating an active region and agate electrode region 22 formed on asemiconductor substrate 11, andFIGS. 2 a to 2 f are cross-sectional diagrams illustrating sequential steps of a method for forming a transistor of a semiconductor device in accordance with a first embodiment of the present invention, taken along lines I-I ofFIG. 1 . - Referring to
FIG. 2 a, an firstepitaxial layer 13 and a conductive secondepitaxial layer 15 are sequentially formed on thesemiconductor substrate 11 consisting of silicon. - Preferably, the first
epitaxial layer 13 is an epitaxial SiGe layer formed under an atmosphere of a mixture gas of a gas from the group consisting of GeH4, SiH4, SiH2Cl2 and combinations thereof, HCl and H2, and has a thickness ranging from 50 to 1000 Å, and the secondepitaxial layer 15 is an epitaxial Si layer formed under an atmosphere of a gas from the group consisting of SiH4, SiH2Cl2 and combinations thereof, HCl and H2, and has a thickness ranging from 50 to 1000 Å. - A pad oxide film (not shown) and a nitride film (not shown) are sequentially formed on the entire surface of the resulting structure.
- Thereafter, the nitride film, the oxide film, the second
epitaxial layer 15, the firstepitaxial layer 13 and a predetermined depth ofsemiconductor substrate 11 are etched via a photoetching process using a device isolation mask (not shown) to form a trench. Adevice isolation film 17 is formed by filling the trench to define an active region. - Next, the second
epitaxial layer 15 is subjected to an implant process using thedevice isolation film 17 as a mask. The implant process is preferably performed using As having a concentration ranging from 1.0 E12 to 5.0 E13 atoms/cm2 with an energy ranging from 10 to 100 KeV. Other conventional impurities may be used. - A
thermal oxide film 19 is formed on the entire surface of the resulting structure. The thermal oxide film preferably has a thickness ranging from 10 to 200 Å. Asacrificial film 21 is then formed on thethermal oxide film 19. Preferably, thesacrificial film 21 may be an oxide film, nitride film or polysilicon film having a thickness ranging from 500 to 3000 Å and used as a mask. - Referring to
FIG. 2 b, agate electrode region 22 exposing thesemiconductor substrate 11 is formed by sequentially etching thesacrificial film 21, thethermal oxide film 19, the secondepitaxial layer 15 and the firstepitaxial layer 13 via a photoetching process using a mask exposing an region corresponding to thegate electrode region 22 ofFIG. 1 . - Referring to
FIG. 2 c, the firstepitaxial layer 13 exposed by a lower sidewall of thegate electrode region 22 is removed to form an under-cut 23 under the secondepitaxial layer 15. Preferably, the process for removing the exposed portion of the firstepitaxial layer 13 is a wet etching process or an isotropic dry etching process utilizing etching selectivity differences among adjacent layers and the firstepitaxial layer 13. - Specifically, the wet etching process is preferably performed using a solution containing H2O, H2O2 and NH4OH having a ratio of 5:1:1 at a temperature ranging from 70 to 80° C. (ref. F. S. Johnson et al. journal of electronic materials,
vol 21, p. 805-810, 1992). The isotropic dry etching process is preferably a plasma etching process using HBr, O2 and Cl2, and more preferably performed using microwaves to improve isotropic etching properties. In addition, the plasma etching process may be performed using SF6. - Now referring to
FIG. 2 d, aninsulating film 25 for filling the under-cut 23 is formed on the entire surface of the resulting structure. Preferably, theinsulating film 25 is an oxide film or nitride film. - The
insulating film 25 is preferably formed via thermal oxidation, chemical vapor deposition (CVD) or atomic layer deposition (ALD). - Preferably, the CVD process is performed using SiH4 and N2O under a pressure of 50 Torr and at a temperature ranging from 50 to 800° C. The thermal oxidation process is a dry or wet process performed at a temperature of 700 to 1100° C.
- Referring to
FIG. 2 e, a wet etching process is performed so that only the portion of theinsulating film 25 in the under-cut 23 remains. The wet etching process is preferably performed using a HF group etching solution. - As shown in
FIG. 2 f, a thirdepitaxial layer 27 is grown on thesemiconductor substrate 11 exposed by thegate electrode region 22. - Preferably, the third
epitaxial layer 27 is an epitaxial Si layer having a thickness ranging from 100 to 2000 Å formed under an atmosphere of a mixture gas of a gas from the group consisting of SiH4, SiH2Cl2 and combinations thereof, HCl and H2. - The
sacrificial oxide film 21 and thethermal oxide film 19 are removed via a wet etching process. Preferably, the wet etching process is performed by utilizing the etching selectivity difference among adjacent other layers and thesacrificial oxide film 21. - A channel region is formed on the third
epitaxial layer 27 by performing a channel implant process and a punch stop implant process. - A gate electrode having a stacked structure of a
gate oxide film 29, a conductive layer forgate electrode 31 and ahard mask layer 33 is formed via a photoetching process using a gate electrode mask. Conventional conductive materials may be used as the conductive layer forgate electrode 31. Thehard mask layer 33 is preferably a nitride film or an oxide film. - The formation of the channel region and removal of the
sacrificial oxide film 21 and thethermal oxide film 19 may be performed prior to the formation of the gate electrode. - In the transistor of the semiconductor device formed according to the method of
FIGS. 2 a to 2 f, the conductive thirdepitaxial layer 27 formed in the active region of thesemiconductor substrate 11 corresponds to the channel region of the transistor. The stacked structure of theinsulating film 25 and the conductive secondepitaxial layer 15 is formed at both sides of the thirdepitaxial layer 27, and thegate insulating film 29 and thegate electrode 31 are formed on the thirdepitaxial layer 27. The secondepitaxial layer 15 corresponds to a source/drain junction layer, and at least a portion of thegate insulating film 29 overlap with the secondepitaxial layer 15. -
FIGS. 3 a to 3 i are cross-sectional diagrams illustrating sequential steps of a method for forming a transistor of a semiconductor device in accordance with a second embodiment of the present invention, taken along lines I-I ofFIG. 1 . - Referring to
FIG. 3 a, an firstepitaxial layer 43 and a conductive secondepitaxial layer 45 are sequentially formed on thesemiconductor substrate 41 comprised of silicon. Preferably, thefirst epitaxial layer 43 is an epitaxial SiGe layer having a thickness ranging from 50 to 1000 Å formed under an atmosphere of a mixture gas of a gas from the group consisting of GeH4, SiH4, SiH2Cl2 and combinations thereof, HCl and H2, and the second epitaxial layer. 45 is an epitaxial Si layer having a thickness ranging from 50 to 1000 Å formed under an atmosphere of a mixture gas of a gas from the group consisting of SiH4, SiH2Cl2 and combinations thereof, HCl and H2. - A pad oxide film (not shown) and a nitride film (not shown) are sequentially formed on the entire surface of the resulting structure.
- Thereafter, the nitride film, the oxide film, the
second epitaxial layer 45, thefirst epitaxial layer 43 and a predetermined depth ofsemiconductor substrate 41 are etched via a photoetching process using a device isolation mask (not shown) to form a trench. Adevice isolation film 47 is formed by filling the trench to define an active region. - Referring to
FIG. 3 b, a polysilicon layer (not shown) is formed on the entire surface of the resulting structure., and then etched via a photoetching process using a gate electrode mask to form adummy gate electrode 49 in a predetermined region where a gate electrode region is to be formed. The thickness of the polysilicon layer is substantially the same as that of the gate electrode formed in a subsequent process, for example, 500 to 3000 Å in thickness. An oxide film or nitride film may be used other than the polysilicon layer. - Thereafter, the
second epitaxial layer 45 is subjected to an implant process using thedummy gate electrode 49 as a mask. The implant process is preferably performed using As having a concentration ranging from 1.0 E12 to 5.0 E13 atoms/cm2 with an energy ranging from 10 to 100 KeV. Other conventional impurities may be used. - The implant process may also be performed prior to the formation of the polysilicon layer using the
device isolation film 47 as a mask. - Referring to
FIG. 3 c, an insulatingfilm spacer 51, preferably a nitride film or an oxide film is formed at sidewalls of thedummy gate electrode 49. Athermal oxide film 53 is then formed on the entire surface of the resulting structure. - Now referring to
FIG. 3 d, aninterlayer insulating film 55 is formed on the entire surface of the resulting structure, and then planarized to expose the top surface of thedummy gate electrode 49. Preferably, the planarization process is a CMP process. - Referring to
FIG. 3 e, the exposeddummy gate electrode 49 is first removed, and thesecond epitaxial layer 45 and thefirst epitaxial layer 43 are etched using theinterlayer insulating film 55 and the insulatingfilm spacer 51 as a mask to form agate electrode region 57 exposing thesemiconductor substrate 41. - Referring to
FIG. 3 f, thefirst epitaxial layer 43 exposed by a lower sidewall of thegate electrode region 57 is removed to form an under-cut 59 under thesecond epitaxial layer 45. Preferably, the process for removing the exposed portion of thefirst epitaxial layer 43 is a wet etching process or an isotropic dry etching process utilizing etching selectivity differences among adjacent and the first signal-crystalline layer 43. - Specifically, the wet etching process is preferably performed using a solution containing H2O, H2O2, NH4OH having a ratio of 5:1:1 at a temperature ranging from 70 to 80° C. (ref. F. S. Johnson et al. journal of electronic materials,
vol 21, p. 805-810, 1992). The isotropic dry etching process is preferably a plasma etching process using HBr, O2 and Cl2, and more preferably performed using microwaves to improve isotropic etching properties. In addition, the plasma etching process may be performed using SF6. - Referring to
FIG. 3 g, an insulatingfilm 61 for filling the under-cut 59 is formed on the entire surface of the resulting structure. Preferably, the insulatingfilm 61 is an oxide film or a nitride film. - The insulating
film 61 is preferably formed via thermal oxidation, chemical vapor deposition (CVD) or atomic layer deposition (ALD). - Preferably, the CVD process is performed using SiH4 and N2O under a pressure of 50 Torr and at a temperature ranging from 50 to 800° C. The thermal oxidation process is a dry or wet process performed at a temperature ranging from 700 to 1100° C.
- Referring to
FIG. 3 h, a wet etching process is performed so that only the portion of the insulatingfilm 61 in the under-cut 59 remains. The wet etching process is preferably performed using a HF group etching solution. - Referring to
FIG. 3 i, athird epitaxial layer 63, which is preferably an epitaxial Si layer having a thickness ranging from 100 to 2000 Å, is grown on thesemiconductor substrate 41 exposed by thegate electrode region 57. - A channel region is formed on the
third epitaxial layer 63 by performing a channel implant process and a punch stop implant process. - A
gate oxide film 65 is grown on thethird epitaxial layer 63, and a conductive layer forgate electrode 67 is formed on thegate oxide film 65, and then planarized using theinterlayer insulating film 55 as an etch barrier to form a gate electrode. - The gate electrode may include a stacked structure of a conductive layer and a hard mask layer.
- As discussed earlier, in accordance with the present invention, the transistor of the semiconductor device and the method for forming the same have the following advantages:
- 1. Generation of junction leakage current is prevented.
- 2. Removal of capacitance generated by junction depletion provides improved operation speed of the device.
- 3. Improved short channel effects/drain induced barrier lowering characteristics due to the decrease in junction depth provide decrease of a critical dimension of the gate electrode and less threshold voltage reduction.
- 4. The epitaxial Si layer consisting the source/drain junction region represses depletion in a bulk-wise direction to improve punch-through characteristics and allows a reduction of the dose of punch stop implant to improve refresh characteristics of the DRAM.
- 5. The improved punch-through characteristics allow reduction of channel threshold voltage control implant dose, thereby improving swing phenomenon and leakage current characteristics in an off state.
- 6. An increase in junction breakdown voltage allows a high-speed operation of the device which uses a high driving voltage.
- 7. A remarkable decrease in leakage current between the devices allows reduction of the depth and width of the device isolation film and achievement of high integration.
- 8. The epitaxial channel region and the source/drain junction region provide an improved interface characteristics of the semiconductor substrate.
- As the present invention may be embodied in several forms without departing from the spirit or essential characteristics thereof, it should also be understood that the above-described embodiments are not limited by any of the details of the foregoing description, unless otherwise specified, but rather should be construed broadly within its spirit and scope as defined in the appended claims, and therefore all changes and modifications that fall within the metes and bounds of the claims, or equivalences of such metes and bounds are therefore intended to be embraced by the appended claims.
Claims (7)
1. A transistor of a semiconductor device, comprising:
an epitaxial channel region disposed on an active region of a semiconductor substrate;
a stacked structure of an insulating film and an epitaxial source/drain junction layer disposed at both sides of the channel region; and
a stacked structure of a gate insulating film and a gate electrode disposed on the epitaxial channel region, wherein at least a portion of the gate insulating film overlap with the source/drain junction layer.
2. The transistor of claim 1 , wherein the insulating film is an oxide film or a nitride film.
3. The transistor of claim 1 , wherein the insulating film and the source/drain junction layer have a thickness ranging from 50 to 1000 Å, respectively.
4. The transistor of claim 1 , further comprising a device isolation film defining the active region, the thickness of the device isolation film being substantially the same as that of the stacked structure of the insulating film and the source/drain junction layer.
5. The transistor of claim 1 , wherein the source/drain junction layer and the channel region consist of epitaxial Si layers.
6. The transistor of claim 1 , wherein the thickness of the epitaxial channel region is substantially the same as that of the stacked structure of the insulating film and the source/drain junction layer.
7-26. (canceled).
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US10/608,194 US6852559B2 (en) | 2002-12-06 | 2003-06-30 | Transistor of semiconductor device, and method for manufacturing the same |
US11/018,350 US20050104055A1 (en) | 2002-12-06 | 2004-12-22 | Transistor of semiconductor device, and method for manufacturing the same |
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KR20040049658A (en) | 2004-06-12 |
KR100487922B1 (en) | 2005-05-06 |
US20040108558A1 (en) | 2004-06-10 |
US6852559B2 (en) | 2005-02-08 |
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