US20040212025A1 - High k oxide - Google Patents
High k oxide Download PDFInfo
- Publication number
- US20040212025A1 US20040212025A1 US10/425,511 US42551103A US2004212025A1 US 20040212025 A1 US20040212025 A1 US 20040212025A1 US 42551103 A US42551103 A US 42551103A US 2004212025 A1 US2004212025 A1 US 2004212025A1
- Authority
- US
- United States
- Prior art keywords
- dielectric constant
- oxide
- gate oxide
- twenty
- hfo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 15
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 19
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 230000007547 defect Effects 0.000 claims description 6
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 6
- 230000002950 deficient Effects 0.000 claims description 4
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 10
- 230000000295 complement effect Effects 0.000 abstract description 3
- 239000000654 additive Substances 0.000 description 13
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 229910052593 corundum Inorganic materials 0.000 description 5
- 229910001845 yogo sapphire Inorganic materials 0.000 description 5
- 230000005684 electric field Effects 0.000 description 3
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- OQAQJWFVENTVSM-UHFFFAOYSA-N azorous acid Chemical compound ON(O)O OQAQJWFVENTVSM-UHFFFAOYSA-N 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 229960001730 nitrous oxide Drugs 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229960005196 titanium dioxide Drugs 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28158—Making the insulator
- H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
- H01L21/28185—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation with a treatment, e.g. annealing, after the formation of the gate insulator and before the formation of the definitive gate conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28158—Making the insulator
- H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
- H01L21/28194—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation by deposition, e.g. evaporation, ALD, CVD, sputtering, laser deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28158—Making the insulator
- H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
- H01L21/28202—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation in a nitrogen-containing ambient, e.g. nitride deposition, growth, oxynitridation, NH3 nitridation, N2O oxidation, thermal nitridation, RTN, plasma nitridation, RPN
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823857—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the gate insulating layers, e.g. different gate insulating layer thicknesses, particular gate insulator materials or particular gate insulator implants
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/51—Insulating materials associated therewith
- H01L29/517—Insulating materials associated therewith the insulating material comprising a metallic compound, e.g. metal oxide, metal silicate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/51—Insulating materials associated therewith
- H01L29/518—Insulating materials associated therewith the insulating material containing nitrogen, e.g. nitride, oxynitride, nitrogen-doped material
Definitions
- Embodiments of the invention relate to semiconductor manufacturing. More particularly, embodiment of the invention relate to the formation of a thin, thermally stable, substantially defect-free gate oxide within a complementary metal-oxide-semiconductor (“CMOS”) device.
- CMOS complementary metal-oxide-semiconductor
- Gate oxides typically consist of a combination of a relatively high k (dielectric constant) dielectric and a relatively moderate k dielectric to produce an overall oxide dielectric constant that is somewhere in between the two.
- typical oxides such as zirconium-dioxide (“ZrO 2 ”) and hafnium-dioxide (“HfO 2 ”), by themselves is generally undesirable, because volumetric expansion from thermal anneal cycles in semiconductor processing can result in the formation of defects in the oxide, causing leakage and reliability problems in the transistor.
- additives such as aluminum-trioxide (“Al 2 O 3 ”)
- Al 2 O 3 aluminum-trioxide
- typical oxides such as ZrO 2 and HfO 2
- k overall effective dielectric constant
- additives, such as Al 2 O 3 can possess fixed charge problems as a result of the bonding configuration between the additive and the oxide.
- Typical gate oxides in modern CMOS processes require a dielectric constant of at least twenty in order to support a dielectric thickness of 1 nm or less reliably. Furthermore, gate oxides must be able to withstand deteriorating effects, such as oxygen-deficient defects and thermal instability, caused by exposure to high temperatures during processing.
- FIG. 1 is a typical CMOS semiconductor device in which at least one embodiment of the invention may be used.
- FIG. 2 is a graph displaying the dielectric constant of an oxide as a function of its TiO 2 content, according to one embodiment of the invention.
- FIG. 3 is a flow diagram illustrating a portion of a semiconductor process that may be used in conjunction with one embodiment of the invention.
- Embodiments of the invention described herein relate to complementary metal-oxide-semiconductor (“CMOS”) processing. More particularly, embodiments of the invention relate to the creation of a gate oxide being sufficiently thin, possessing appropriate physical reliability, and having a suitable dielectric constant so as to be compatible with modern CMOS processing technology.
- CMOS complementary metal-oxide-semiconductor
- FIG. 1 illustrates a CMOS device in which one embodiment of the invention may be used.
- the device of FIG. 1 is an inverter, which consists of an n-type transistor 105 and a p-type transistor 110 .
- a gate oxide 115 In each of the transistors is a gate oxide 115 , across which an electric field is created when a gate voltage is applied to the gate 125 while the body 120 is biased at a lower potential than the gate.
- the gate oxide in typical modern CMOS devices is less than 1 nm thick, but should also have a dielectric constant greater than twenty in order to support the electric field applied from the gate to the substrate. Because thinner oxides require less dielectric material than thicker oxides, the dielectric constant (k) should be sufficiently high to compensate for the thinner dielectric.
- the n-type dielectric typically consists of ZrO 2
- the p-type dielectric typically consists of HfO 2
- high k additives such as yttrium-trioxide (“Y 2 O 3 ”), lanthanum-trioxide (“La 2 O 3 ”), and titanium-dioxide (“TiO 2 ”), are combined with the oxides, ZrO 2 and HfO 2 , in one embodiment of the invention.
- the combined dielectric constant of ZrO 2 or HfO 2 and any one of the above high k additives is sufficiently high (>20) to support an electric field across a gate oxide of less than 1 nm. Furthermore, the above additives are substantially free of the fixed charge problems associated with additives, such as Al 2 O 3 , when bonded with the oxides.
- additives in other embodiments of the invention may be used that can be bonded with ZrO 2 and HfO 2 without the combination suffering from fixed charge problems while yielding an overall effective dielectric constant necessary to support a particular gate oxide thickness.
- the particular ratio between one of the above additives and the combined oxide depends upon the dielectric constant that is desired for the application and not limited to the embodiment of the invention discussed above.
- FIG. 2 is a graph illustrating the effective gate oxide's dielectric constant as a function of the percentage of TiO 2 combined with HfO 2 .
- the relationship between the TiO 2 content and the gate oxide dielectric constant is substantially linear when TiO 2 is combined with any one of the oxides, ZrO 2 or HfO 2 .
- FIG. 3 is a flow diagram illustrating at least some of the process operations that may be used to carry out one embodiment of the invention. The particular point in the process in which these operations are used is dependent upon the particular process being used.
- ZrO 2 and HfO 2 are combined with any one of the additives, Y 2 O 3 , La 2 O 3 , and TiO 2 , in order to form a gate oxide having a high crystallization onset and sufficient dielectric constant of at least twenty while not displaying the fixed charge problems associated with some additives, such as Al 2 O 3 .
- the combination is cured by exposing the gate oxide to a low oxygen partial pressure anneal at operation 305 .
- the anneal operation exposes the gate oxide to a minimum oxygen ambient atmosphere to cure defects while minimizing interfacial oxide growth, which can happen rapidly at certain atmospheric pressures for high k materials.
- a partial pressure of ⁇ 1 ⁇ 10 ⁇ 3 Torr is used in order to avoid undesirable oxide leakage and interfacial oxide growth.
- the particular anneal pressure and temperature to be used depends upon the particular oxide and additive combination used to form the gate oxide.
- the combination is doped with nitrogen in order to promote thermal stability at high temperatures, such as >1000 C, during CMOS processing.
- Nitrogen may be introduced to the combination via various process techniques, including plasma nitridation, thermal nitrogen anneal containing an ambient, such as nitrogen-hydroxide (“NH 3 ”), nitrous-oxide (“NO”), nitrous-dioxide (“NO 2 ”), and nitrogen (“N 2 ”), and implantation.
- NH 3 nitrogen-hydroxide
- NO nitrous-oxide
- NO 2 nitrous-dioxide
- N 2 nitrogen
Abstract
A technique for producing a thin gate oxide having a relatively high dielectric constant. Embodiments relate to the structure and development of a gate oxide having a thickness of less than 1 nm, having a dielectric constant greater than twenty, and being substantially free of undesired electrical characteristics caused by exposure of the gate oxide to high complementary metal-oxide-semiconductor processing temperatures.
Description
- Embodiments of the invention relate to semiconductor manufacturing. More particularly, embodiment of the invention relate to the formation of a thin, thermally stable, substantially defect-free gate oxide within a complementary metal-oxide-semiconductor (“CMOS”) device.
- As CMOS devices continue to decrease in size, the need for smaller gate oxides increases, while the need for a relatively high overall oxide dielectric constant remains. Gate oxides typically consist of a combination of a relatively high k (dielectric constant) dielectric and a relatively moderate k dielectric to produce an overall oxide dielectric constant that is somewhere in between the two. Furthermore, the use of typical oxides, such as zirconium-dioxide (“ZrO2”) and hafnium-dioxide (“HfO2”), by themselves is generally undesirable, because volumetric expansion from thermal anneal cycles in semiconductor processing can result in the formation of defects in the oxide, causing leakage and reliability problems in the transistor.
- Therefore, additives, such as aluminum-trioxide (“Al2O3”), are typically combined with the oxide to help it remain amorphous during exposure to high temperatures in processing. The combination of additives, such as Al2O3, and typical oxides, such as ZrO2 and HfO2, however, can result in an overall effective dielectric constant (k) that is lower than necessary to accommodate thinner oxides (<1 nm) required in modern CMOS processes. Furthermore, additives, such as Al2O3, can possess fixed charge problems as a result of the bonding configuration between the additive and the oxide.
- Typical gate oxides in modern CMOS processes require a dielectric constant of at least twenty in order to support a dielectric thickness of 1 nm or less reliably. Furthermore, gate oxides must be able to withstand deteriorating effects, such as oxygen-deficient defects and thermal instability, caused by exposure to high temperatures during processing.
- Embodiments of the invention are illustrated by way of example and not limitation in the figures of the accompanying drawings, in which like references indicate similar elements and in which:
- FIG. 1 is a typical CMOS semiconductor device in which at least one embodiment of the invention may be used.
- FIG. 2 is a graph displaying the dielectric constant of an oxide as a function of its TiO2 content, according to one embodiment of the invention.
- FIG. 3 is a flow diagram illustrating a portion of a semiconductor process that may be used in conjunction with one embodiment of the invention.
- Embodiments of the invention described herein relate to complementary metal-oxide-semiconductor (“CMOS”) processing. More particularly, embodiments of the invention relate to the creation of a gate oxide being sufficiently thin, possessing appropriate physical reliability, and having a suitable dielectric constant so as to be compatible with modern CMOS processing technology.
- FIG. 1 illustrates a CMOS device in which one embodiment of the invention may be used. The device of FIG. 1 is an inverter, which consists of an n-
type transistor 105 and a p-type transistor 110. In each of the transistors is agate oxide 115, across which an electric field is created when a gate voltage is applied to thegate 125 while thebody 120 is biased at a lower potential than the gate. - The gate oxide in typical modern CMOS devices is less than 1 nm thick, but should also have a dielectric constant greater than twenty in order to support the electric field applied from the gate to the substrate. Because thinner oxides require less dielectric material than thicker oxides, the dielectric constant (k) should be sufficiently high to compensate for the thinner dielectric.
- The n-type dielectric typically consists of ZrO2, whereas the p-type dielectric typically consists of HfO2. In order to achieve the dielectric constant required by a gate oxide of less than 1 nm, high k additives, such as yttrium-trioxide (“Y2O3”), lanthanum-trioxide (“La2O3”), and titanium-dioxide (“TiO2”), are combined with the oxides, ZrO2 and HfO2, in one embodiment of the invention. The combined dielectric constant of ZrO2 or HfO2 and any one of the above high k additives is sufficiently high (>20) to support an electric field across a gate oxide of less than 1 nm. Furthermore, the above additives are substantially free of the fixed charge problems associated with additives, such as Al2O3, when bonded with the oxides.
- Other additives in other embodiments of the invention may be used that can be bonded with ZrO2 and HfO2 without the combination suffering from fixed charge problems while yielding an overall effective dielectric constant necessary to support a particular gate oxide thickness. Furthermore, the particular ratio between one of the above additives and the combined oxide depends upon the dielectric constant that is desired for the application and not limited to the embodiment of the invention discussed above.
- FIG. 2, for example, is a graph illustrating the effective gate oxide's dielectric constant as a function of the percentage of TiO2 combined with HfO2. Advantageously, the relationship between the TiO2 content and the gate oxide dielectric constant is substantially linear when TiO2 is combined with any one of the oxides, ZrO2 or HfO2.
- FIG. 3 is a flow diagram illustrating at least some of the process operations that may be used to carry out one embodiment of the invention. The particular point in the process in which these operations are used is dependent upon the particular process being used. At operation301, ZrO2 and HfO2 are combined with any one of the additives, Y2O3, La2O3, and TiO2, in order to form a gate oxide having a high crystallization onset and sufficient dielectric constant of at least twenty while not displaying the fixed charge problems associated with some additives, such as Al2O3.
- In order to avoid oxygen-deficient defects that can result in various undesirable electrical properties of the gate oxide when used in a transistor, the combination is cured by exposing the gate oxide to a low oxygen partial pressure anneal at
operation 305. The anneal operation exposes the gate oxide to a minimum oxygen ambient atmosphere to cure defects while minimizing interfacial oxide growth, which can happen rapidly at certain atmospheric pressures for high k materials. For the embodiment illustrated in FIG. 3, a partial pressure of <1×10−3 Torr is used in order to avoid undesirable oxide leakage and interfacial oxide growth. The particular anneal pressure and temperature to be used depends upon the particular oxide and additive combination used to form the gate oxide. - At
operation 310, the combination is doped with nitrogen in order to promote thermal stability at high temperatures, such as >1000 C, during CMOS processing. Nitrogen may be introduced to the combination via various process techniques, including plasma nitridation, thermal nitrogen anneal containing an ambient, such as nitrogen-hydroxide (“NH3”), nitrous-oxide (“NO”), nitrous-dioxide (“NO2”), and nitrogen (“N2”), and implantation. The particular doping technique as well as the ambient to be used with the thermal nitrogen anneal is dependent upon the needs of the particular semiconductor process being used. - While the invention has been described with reference to illustrative embodiments, this description is not intended to be construed in a limiting sense. Various modifications of the illustrative embodiments, as well as other embodiments, which are apparent to persons skilled in the art to which the invention pertains are deemed to lie within the spirit and scope of the invention.
Claims (14)
1. A semiconductor device comprising:
a dielectric including a second material, which when combined with a first material produces a third material having a dielectric constant greater twenty.
2. The semiconductor device of claim 1 wherein the first and second materials each have a dielectric constant greater than twenty.
3. The semiconductor device of claim 1 wherein one of the first and second materials has a dielectric constant greater than twenty and the other material has a dielectric constant less than twenty.
4. The semiconductor device of claim 2 wherein the first material is chosen from a group consisting of ZrO2 and HfO2.
5. The semiconductor device of claim 4 wherein the second material is chosen from a group consisting of Y2O3, La2O3, and TiO2.
6. The semiconductor device of claim 1 wherein the third material is substantially free of oxygen-deficient defects.
7. The semiconductor device of claim 6 wherein the third material is doped with nitrogen.
8-15. (canceled)
16. An apparatus comprising:
a gate oxide comprising a material chosen from a group consisting of HfO2—TiO2, HfO2—Y2O3, HfO2—La2O3, ZrO2—TiO2, ZrO2—Y2O3, and ZrO2—La2O3.
17. The apparatus of claim 16 wherein the material has a dielectric constant greater than twenty.
18. The apparatus of claim 16 wherein the gate oxide has a dielectric constant greater than twenty.
19. The apparatus of claim 17 wherein the material is substantially free of oxygen-deficient defects.
20. The apparatus of claim 19 wherein the material is doped with nitrogen.
21-27. (canceled)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/425,511 US20040212025A1 (en) | 2003-04-28 | 2003-04-28 | High k oxide |
US10/917,886 US7208366B2 (en) | 2003-04-28 | 2004-08-12 | Bonding gate oxide with high-k additives |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/425,511 US20040212025A1 (en) | 2003-04-28 | 2003-04-28 | High k oxide |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/917,886 Division US7208366B2 (en) | 2003-04-28 | 2004-08-12 | Bonding gate oxide with high-k additives |
Publications (1)
Publication Number | Publication Date |
---|---|
US20040212025A1 true US20040212025A1 (en) | 2004-10-28 |
Family
ID=33299517
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/425,511 Abandoned US20040212025A1 (en) | 2003-04-28 | 2003-04-28 | High k oxide |
US10/917,886 Expired - Fee Related US7208366B2 (en) | 2003-04-28 | 2004-08-12 | Bonding gate oxide with high-k additives |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/917,886 Expired - Fee Related US7208366B2 (en) | 2003-04-28 | 2004-08-12 | Bonding gate oxide with high-k additives |
Country Status (1)
Country | Link |
---|---|
US (2) | US20040212025A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080157171A1 (en) * | 2006-12-29 | 2008-07-03 | Prashant Majhi | Dielectric barrier for nanocrystals |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7737050B2 (en) * | 2006-10-30 | 2010-06-15 | International Business Machines Corporation | Method of fabricating a nitrided silicon oxide gate dielectric layer |
US8492247B2 (en) | 2010-08-17 | 2013-07-23 | International Business Machines Corporation | Programmable FETs using Vt-shift effect and methods of manufacture |
US9166020B2 (en) | 2011-03-01 | 2015-10-20 | United Microelectronics Corp. | Metal gate structure and manufacturing method thereof |
US8324118B2 (en) | 2011-03-28 | 2012-12-04 | United Microelectronics Corp. | Manufacturing method of metal gate structure |
US9384962B2 (en) | 2011-04-07 | 2016-07-05 | United Microelectronics Corp. | Oxygen treatment of replacement work-function metals in CMOS transistor gates |
US8530980B2 (en) | 2011-04-27 | 2013-09-10 | United Microelectronics Corp. | Gate stack structure with etch stop layer and manufacturing process thereof |
US20120286402A1 (en) * | 2011-05-12 | 2012-11-15 | Chin-Te Kuo | Protuberant structure and method for making the same |
US8765561B2 (en) | 2011-06-06 | 2014-07-01 | United Microelectronics Corp. | Method for fabricating semiconductor device |
US8673758B2 (en) | 2011-06-16 | 2014-03-18 | United Microelectronics Corp. | Structure of metal gate and fabrication method thereof |
US9490342B2 (en) | 2011-06-16 | 2016-11-08 | United Microelectronics Corp. | Method for fabricating semiconductor device |
US8536038B2 (en) | 2011-06-21 | 2013-09-17 | United Microelectronics Corp. | Manufacturing method for metal gate using ion implantation |
US8486790B2 (en) | 2011-07-18 | 2013-07-16 | United Microelectronics Corp. | Manufacturing method for metal gate |
US8551876B2 (en) | 2011-08-18 | 2013-10-08 | United Microelectronics Corp. | Manufacturing method for semiconductor device having metal gate |
US8872286B2 (en) | 2011-08-22 | 2014-10-28 | United Microelectronics Corp. | Metal gate structure and fabrication method thereof |
US8477006B2 (en) | 2011-08-30 | 2013-07-02 | United Microelectronics Corp. | Resistor and manufacturing method thereof |
US8921238B2 (en) | 2011-09-19 | 2014-12-30 | United Microelectronics Corp. | Method for processing high-k dielectric layer |
US8741784B2 (en) | 2011-09-20 | 2014-06-03 | United Microelectronics Corp. | Process for fabricating semiconductor device and method of fabricating metal oxide semiconductor device |
US8426277B2 (en) | 2011-09-23 | 2013-04-23 | United Microelectronics Corp. | Semiconductor process |
US9000568B2 (en) | 2011-09-26 | 2015-04-07 | United Microelectronics Corp. | Semiconductor structure and fabrication method thereof |
US8633549B2 (en) | 2011-10-06 | 2014-01-21 | United Microelectronics Corp. | Semiconductor device and fabrication method thereof |
US8802579B2 (en) | 2011-10-12 | 2014-08-12 | United Microelectronics Corp. | Semiconductor structure and fabrication method thereof |
US9006092B2 (en) | 2011-11-03 | 2015-04-14 | United Microelectronics Corp. | Semiconductor structure having fluoride metal layer and process thereof |
US8440511B1 (en) | 2011-11-16 | 2013-05-14 | United Microelectronics Corp. | Method for manufacturing multi-gate transistor device |
US8691681B2 (en) | 2012-01-04 | 2014-04-08 | United Microelectronics Corp. | Semiconductor device having a metal gate and fabricating method thereof |
US8987096B2 (en) | 2012-02-07 | 2015-03-24 | United Microelectronics Corp. | Semiconductor process |
US8860181B2 (en) | 2012-03-07 | 2014-10-14 | United Microelectronics Corp. | Thin film resistor structure |
US9478627B2 (en) | 2012-05-18 | 2016-10-25 | United Microelectronics Corp. | Semiconductor structure and process thereof |
US9105623B2 (en) | 2012-05-25 | 2015-08-11 | United Microelectronics Corp. | Semiconductor device having metal gate and manufacturing method thereof |
US8501636B1 (en) | 2012-07-24 | 2013-08-06 | United Microelectronics Corp. | Method for fabricating silicon dioxide layer |
US8975666B2 (en) | 2012-08-22 | 2015-03-10 | United Microelectronics Corp. | MOS transistor and process thereof |
US9012300B2 (en) | 2012-10-01 | 2015-04-21 | United Microelectronics Corp. | Manufacturing method for a shallow trench isolation |
US9054172B2 (en) | 2012-12-05 | 2015-06-09 | United Microelectrnics Corp. | Semiconductor structure having contact plug and method of making the same |
US9117878B2 (en) | 2012-12-11 | 2015-08-25 | United Microelectronics Corp. | Method for manufacturing shallow trench isolation |
US8735269B1 (en) | 2013-01-15 | 2014-05-27 | United Microelectronics Corp. | Method for forming semiconductor structure having TiN layer |
US9653300B2 (en) | 2013-04-16 | 2017-05-16 | United Microelectronics Corp. | Structure of metal gate structure and manufacturing method of the same |
US9159798B2 (en) | 2013-05-03 | 2015-10-13 | United Microelectronics Corp. | Replacement gate process and device manufactured using the same |
US9196542B2 (en) | 2013-05-22 | 2015-11-24 | United Microelectronics Corp. | Method for manufacturing semiconductor devices |
US8921947B1 (en) | 2013-06-10 | 2014-12-30 | United Microelectronics Corp. | Multi-metal gate semiconductor device having triple diameter metal opening |
US9105720B2 (en) | 2013-09-11 | 2015-08-11 | United Microelectronics Corp. | Semiconductor device having metal gate and manufacturing method thereof |
US20150069534A1 (en) | 2013-09-11 | 2015-03-12 | United Microelectronics Corp. | Semiconductor device and method for fabricating the same |
US9196546B2 (en) | 2013-09-13 | 2015-11-24 | United Microelectronics Corp. | Metal gate transistor |
US8951884B1 (en) | 2013-11-14 | 2015-02-10 | United Microelectronics Corp. | Method for forming a FinFET structure |
US9231071B2 (en) | 2014-02-24 | 2016-01-05 | United Microelectronics Corp. | Semiconductor structure and manufacturing method of the same |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4353047A (en) * | 1979-01-29 | 1982-10-05 | Nippon Electric Co., Ltd. | (1-x)BaO.xTiO2 System dielectric material for use in a microwave device |
US5292673A (en) * | 1989-08-16 | 1994-03-08 | Hitachi, Ltd | Method of manufacturing a semiconductor device |
US5810923A (en) * | 1994-08-17 | 1998-09-22 | Tdk Corporation | Method for forming oxide thin film and the treatment of silicon substrate |
US20020151125A1 (en) * | 2001-04-11 | 2002-10-17 | Samsung Electronics Co., Ltd. | Method of forming a CMOS type semiconductor device having dual gates |
US6509282B1 (en) * | 2001-11-26 | 2003-01-21 | Advanced Micro Devices, Inc. | Silicon-starved PECVD method for metal gate electrode dielectric spacer |
US20030030099A1 (en) * | 2001-05-04 | 2003-02-13 | Jung-Yu Hsieh | Flash memory structure |
US20030176049A1 (en) * | 2002-03-15 | 2003-09-18 | Hegde Rama I. | Gate dielectric and method therefor |
US20030183870A1 (en) * | 2002-03-27 | 2003-10-02 | Fujitsu Limited | Semiconductor memory device and manufacturing method thereof |
US20030215996A1 (en) * | 2000-04-14 | 2003-11-20 | Matti Putkonen | Process for producing oxide thin films |
US20030222319A1 (en) * | 2002-05-31 | 2003-12-04 | Kenichi Azuma | Semiconductor device having a low dielectric constant film and manufacturing method thereof |
US20040023461A1 (en) * | 2002-07-30 | 2004-02-05 | Micron Technology, Inc. | Atomic layer deposited nanolaminates of HfO2/ZrO2 films as gate dielectrics |
US20040152340A1 (en) * | 1999-06-04 | 2004-08-05 | Naoki Yamamoto | Semiconductor integrated circuit device and method for manufacturing the same |
US20040191974A1 (en) * | 2003-03-27 | 2004-09-30 | Gilmer David C. | Method for fabricating dual-metal gate device |
US20040214399A1 (en) * | 2003-04-22 | 2004-10-28 | Micron Technology, Inc. | Atomic layer deposited ZrTiO4 films |
US7008832B1 (en) * | 2000-07-20 | 2006-03-07 | Advanced Micro Devices, Inc. | Damascene process for a T-shaped gate electrode |
-
2003
- 2003-04-28 US US10/425,511 patent/US20040212025A1/en not_active Abandoned
-
2004
- 2004-08-12 US US10/917,886 patent/US7208366B2/en not_active Expired - Fee Related
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4353047A (en) * | 1979-01-29 | 1982-10-05 | Nippon Electric Co., Ltd. | (1-x)BaO.xTiO2 System dielectric material for use in a microwave device |
US5292673A (en) * | 1989-08-16 | 1994-03-08 | Hitachi, Ltd | Method of manufacturing a semiconductor device |
US5810923A (en) * | 1994-08-17 | 1998-09-22 | Tdk Corporation | Method for forming oxide thin film and the treatment of silicon substrate |
US20040152340A1 (en) * | 1999-06-04 | 2004-08-05 | Naoki Yamamoto | Semiconductor integrated circuit device and method for manufacturing the same |
US20030215996A1 (en) * | 2000-04-14 | 2003-11-20 | Matti Putkonen | Process for producing oxide thin films |
US7008832B1 (en) * | 2000-07-20 | 2006-03-07 | Advanced Micro Devices, Inc. | Damascene process for a T-shaped gate electrode |
US20020151125A1 (en) * | 2001-04-11 | 2002-10-17 | Samsung Electronics Co., Ltd. | Method of forming a CMOS type semiconductor device having dual gates |
US20030030099A1 (en) * | 2001-05-04 | 2003-02-13 | Jung-Yu Hsieh | Flash memory structure |
US6509282B1 (en) * | 2001-11-26 | 2003-01-21 | Advanced Micro Devices, Inc. | Silicon-starved PECVD method for metal gate electrode dielectric spacer |
US20030176049A1 (en) * | 2002-03-15 | 2003-09-18 | Hegde Rama I. | Gate dielectric and method therefor |
US20030183870A1 (en) * | 2002-03-27 | 2003-10-02 | Fujitsu Limited | Semiconductor memory device and manufacturing method thereof |
US20030222319A1 (en) * | 2002-05-31 | 2003-12-04 | Kenichi Azuma | Semiconductor device having a low dielectric constant film and manufacturing method thereof |
US20040023461A1 (en) * | 2002-07-30 | 2004-02-05 | Micron Technology, Inc. | Atomic layer deposited nanolaminates of HfO2/ZrO2 films as gate dielectrics |
US20040191974A1 (en) * | 2003-03-27 | 2004-09-30 | Gilmer David C. | Method for fabricating dual-metal gate device |
US20040214399A1 (en) * | 2003-04-22 | 2004-10-28 | Micron Technology, Inc. | Atomic layer deposited ZrTiO4 films |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080157171A1 (en) * | 2006-12-29 | 2008-07-03 | Prashant Majhi | Dielectric barrier for nanocrystals |
US7763511B2 (en) | 2006-12-29 | 2010-07-27 | Intel Corporation | Dielectric barrier for nanocrystals |
Also Published As
Publication number | Publication date |
---|---|
US20050012164A1 (en) | 2005-01-20 |
US7208366B2 (en) | 2007-04-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7208366B2 (en) | Bonding gate oxide with high-k additives | |
KR101442238B1 (en) | Method of manufacturing Semiconductor Device by using High-Pressure Oxygen Annealing | |
US6821873B2 (en) | Anneal sequence for high-κ film property optimization | |
US20040262700A1 (en) | Lanthanide oxide / hafnium oxide dielectrics | |
US20050215015A1 (en) | Dielectric layer forming method and devices formed therewith | |
US20100187644A1 (en) | Manufacturing method of semiconductor device | |
WO2009042028A2 (en) | Lanthanide dielectric with controlled interfaces | |
US6235594B1 (en) | Methods of fabricating an integrated circuit device with composite oxide dielectric | |
US6753229B1 (en) | Multiple-thickness gate oxide formed by oxygen implantation | |
US20040164329A1 (en) | Semiconductor device and method of manufacturing the same | |
EP1290733A1 (en) | Semiconductor device and method for manufacturing the same | |
US20040169240A1 (en) | Semiconductor device and method of manufacturing semiconductor device | |
US6245606B1 (en) | Low temperature method for forming a thin, uniform layer of aluminum oxide | |
US7351626B2 (en) | Method for controlling defects in gate dielectrics | |
US6528377B1 (en) | Semiconductor substrate and method for preparing the same | |
TW200525688A (en) | Method for producing dielectric layer of high-k gate in MOST | |
US6797645B2 (en) | Method of fabricating gate dielectric for use in semiconductor device having nitridation by ion implantation | |
JPH0376272A (en) | Insulated gate type field effect transistor | |
JPH02155273A (en) | Mos field-effect transistor | |
JPH01283872A (en) | Manufacture of mis type semiconductor device | |
US6995064B2 (en) | Halogen gettering method for forming field effect transistor (FET) device | |
EP0911869A2 (en) | Low temperature method for forming a uniform thin oxide layer | |
US20060094259A1 (en) | Forming gas anneal process for high dielectric constant gate dielectrics in a semiconductor fabrication process | |
US7030038B1 (en) | Low temperature method for forming a thin, uniform oxide | |
US20060220158A1 (en) | Semiconductor device and manufacturing method thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: INTEL CORPORATION, CALIFORNIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:TSAI, WILMAN;REEL/FRAME:014364/0110 Effective date: 20030717 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |