US20040033665A1 - Structure and method of controlling short-channel effect of very short channel MOSFET - Google Patents
Structure and method of controlling short-channel effect of very short channel MOSFET Download PDFInfo
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- US20040033665A1 US20040033665A1 US10/641,522 US64152203A US2004033665A1 US 20040033665 A1 US20040033665 A1 US 20040033665A1 US 64152203 A US64152203 A US 64152203A US 2004033665 A1 US2004033665 A1 US 2004033665A1
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66575—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate
- H01L29/66583—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate with initial gate mask or masking layer complementary to the prospective gate location, e.g. with dummy source and drain contacts
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- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823412—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the channel structures, e.g. channel implants, halo or pocket implants, or channel materials
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- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823437—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the gate conductors, e.g. particular materials, shapes
- H01L21/823456—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the gate conductors, e.g. particular materials, shapes gate conductors with different shapes, lengths or dimensions
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1025—Channel region of field-effect devices
- H01L29/1029—Channel region of field-effect devices of field-effect transistors
- H01L29/1033—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure
- H01L29/1041—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure with a non-uniform doping structure in the channel region surface
- H01L29/1045—Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure with a non-uniform doping structure in the channel region surface the doping structure being parallel to the channel length, e.g. DMOS like
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66537—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using a self aligned punch through stopper or threshold implant under the gate region
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66553—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using inside spacers, permanent or not
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Abstract
A semiconductor device comprising a gate having an approximately 0.05 μm channel length, an oxide layer below the gate, a self-aligned compensation implant below the oxide layer, a halo implant surrounding the self-aligned compensation implant below the oxide layer; and gate and drain regions on opposite sides of the halo implant and below the oxide layer.
Description
- 1. Field of the Invention
- The present invention generally relates to doped semiconductor transistors and more particularly to doped short-channel devices which have channel lengths less than 0.05 μm and which maintain acceptable threshold voltages, and methods of making such devices.
- 2. Description of the Related Art
- Conventional metal oxide semiconductor field effect transistor (MOSFET) device structures are continuously being reduced in size to increase processing speed and decrease manufacturing cost. Conventional methods of reducing the size of MOSFET devices shrink all the dimensions of the device proportionally.
- However, as the channel length in the MOSFET is reduced to increase speed, a “short-channel” effect often occurs which severely degrades the device characteristics. More specifically, the short channel effect is an undesirable increase in the threshold voltage of the gate as the channel length is reduced.
- Therefore, there is a conventional need for a method and structure which overcomes the short channel effect and allows MOSFET structures having channel lengths of approximately 0.051 μm to produce consistent threshold voltages.
- It is, therefore, an object of the present invention to provide a structure and method for a doping profile for controlling short-channel devices having channel lengths down below 0.05 μm, and the methods of making such profiles.
- More specifically, the invention is a semiconductor device comprising a gate, an oxide layer below the gate, a self-aligned compensation implant below the oxide layer, a halo implant surrounding the self-aligned compensation implant below the oxide layer, and gate and drain regions on opposite sides of the halo implant and below the oxide layer. The self-aligned compensation implant reduces a threshold voltage of the semiconductor device and has a doping concentration for controlling a threshold voltage reduction of the semiconductor device that varies depending upon a channel length of the semiconductor device.
- The invention also includes method of manufacturing a semiconductor device comprising steps of successively depositing an oxide layer and a dielectric layer on a semiconductor substrate, forming a channel in the oxide layer and the dielectric layer, forming spacers in the channel, implanting an impurity in the semiconductor substrate through the channel to form a self-aligned compensation implant in the semiconductor substrate, depositing an oxide layer in the channel on the semiconductor substrate, filling the channel with a conductive material to form a gate over the oxide layer, removing all of the dielectric layer, removing a portion of the oxide layer such that the oxide layer remains between the gate and the semiconductor substrate, and doping areas of the semiconductor substrate adjacent the gate to form a halo implant and source and drain regions in the semiconductor substrate.
- The implanting step further comprises a step of varying a doping concentration of the self-aligned compensation implant for controlling a threshold voltage reduction of the semiconductor device. The step of varying a doping concentration of the self-aligned compensation implant is dependent upon a channel length of the semiconductor device.
- The invention also includes a method of manufacturing a semiconductor device comprising steps of successively depositing an oxide layer and a dielectric layer on a semiconductor substrate, forming a channel in the oxide layer and the dielectric layer, depositing an oxide layer in the channel on the semiconductor substrate, partially filling the channel with a conductive material, implanting an impurity in the semiconductor substrate through the conductive material and the oxide layer in the channel to form a self-aligned compensation implant in the semiconductor substrate, completely filling the channel with the conductive material to form a gate over the oxide layer, removing all of the dielectric layer, removing a portion of the oxide layer such that the oxide layer remains between the gate and the semiconductor substrate, and doping areas of the semiconductor substrate adjacent the gate to form a halo implant and source and drain regions in the semiconductor substrate.
- Once again, the implanting step further comprises a step of varying a doping concentration of the self-aligned compensation implant for controlling a threshold voltage reduction of the semiconductor device and the step of varying a doping concentration of the self-aligned compensation implant is dependent upon a channel length of the semiconductor device.
- The invention also includes a method of manufacturing a semiconductor device comprising steps of forming a sacrificial mask over a gate area of a substrate, forming spacers adjacent the sacrificial mask, forming an opening in the sacrificial mask, implanting an impurity in the semiconductor substrate through the opening in the sacrificial mask to form a self-aligned compensation implant in the semiconductor substrate, removing the sacrificial mask, depositing an oxide layer between the spacers on the semiconductor substrate, forming a gate between the spacers and over the oxide layer, and doping areas of the semiconductor substrate adjacent the gate to form a halo implant and source and drain regions in the semiconductor substrate.
- Again, the implanting step further comprises a step of varying a doping concentration of the self-aligned compensation implant the step of varying a doping concentration of the self-aligned compensation implant is dependent upon a channel length of the semiconductor device.
- FIG. 1 is a schematic diagram of a cross-sectional view of a semiconductor device;
- FIG. 2 is a schematic diagram of a cross-sectional view of a semiconductor device;
- FIG. 3 is a chart showing the relationship between a target threshold voltage and a channel length of a semiconductor device;
- FIG. 4 is a schematic diagram of a cross-sectional view of a semiconductor device;
- FIG. 5 is a chart showing the relationship between a target threshold voltage and a channel length of a semiconductor device;
- FIG. 6 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 7 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 8 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 9 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 10 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 11 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 12 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 13 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 14 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 15 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 16 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 17 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 18 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 19 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 20 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 21 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 22 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device;
- FIG. 23 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device; and
- FIG. 24 is a schematic diagram showing a cross-sectional view of a stage of development of a semiconductor device.
- Referring now to the drawings, and more particularly to FIG. 1, a MOSFET device having a
gate 10,gate oxide layer 11,source region 12 anddrain region 13 is illustrated. When reducing the size of the MOSFET, the dimension of theoxide thickness 11 and thejunction depth 15 can preferably be decreased and thedepletion region 16 can preferably be effectively reduced by increasing the substrate doping. - When the
channel length 14 is reduced to 0.1 μm, a “halo implant” 20, as shown in FIG. 2, can preferably be used to control the short channel effect. As mentioned above, the short channel effect is an undesirable increase in the threshold voltage of thegate 10 as thechannel length 14 is reduced. Thehalo implant 20 is a ring-shaped structure which is positioned between thegate 12 anddrain 13 and below theoxide layer 11. - The
halo implant 20 reduces the short channel effect by surrounding the source-drain extensions to prevent electrical field line penetration. Thehalo implant 20 introduces a lateral nonuniformity, which is essential for controlling the short-channel effect and is useful down to channel lengths around 0.08 μm. - However, at approximately 0.05 μm, the
halo implant 20 begins to reach a limitation in the ability to control the short-channel effect. More specifically, when channel lengths are reduced below 0.05 μm, thedistribution tails 21 of thehalo implant 20 tend to be too long, which increases the threshold voltage unacceptably, producing a situation known as “Vt roll-off”. Also, the concentration ofhalo implant 20 can be too high, which causes tunneling leakage current to increase. - The
halo implant 20, which has a three-dimensional ring or doughnut-shaped structure, tends to lose the opening or “hole” at the center of the structure when the size of the channel is reduced. In other words, when the channel length is reduced below 0.05 μm, the inner surfaces of the halo structure may join, due to thelateral distribution tails 21 overlapping, thereby severely altering the threshold voltage (Vt) of the device. - Because of this problem, it is difficult to produce a device having a channel length less than 0.08 μm (within the normally acceptable range of manufactureable tolerances) and a stable threshold voltage.
- This problem is graphically illustrated in FIG. 3. A typical range of manufactureable tolerances of channel lengths is shown on the horizontal axis of FIG. 3. More specifically, FIG. 3 illustrates a mean value for an effective channel length (e.g., nominal leff) which is preferably approximately 0.05 μm and a tolerance between a worse case long channel length and a worse case short channel length. The tolerance range of channel length results from variations which would be expected in a normal manufacturing process. For example, the tolerance range could be +/0.017 μm the preferable target channel length of 0.05 μm.
- The vertical axis in FIG. 3 represents the threshold voltage Vt and more specifically shows a target threshold voltage range (Vt) for the device. For example, the target threshold voltage range is preferably 0.35 V+/0.15 V.
-
Line 30 represents the threshold voltages of more heavily doped devices andline 31 represents the threshold voltages of lighter doped devices, where each of the devices includes a conventional halo implant. - More specifically, lines30, 31 illustrate the “short-channel effect” (e.g., threshold voltage roll-off).
Line 30 illustrates that only those heavily doped devices which have channel lengths substantially shorter than the standard channel length (e.g., nominal leff) will perform adequately and exhibit the target threshold voltage and that nominal leff and larger channel length devices will have a threshold voltage which is above the target threshold voltage. - Similarly,
line 31 illustrates that even if the doping of the devices is changed (e.g., made lighter), not all ranges of channel lengths expected within a given manufacturing tolerance will produce the desired target threshold voltage. Specifically, those devices having a channel length which is less than nominal leff will have a threshold voltage which is below the target threshold voltage and only those devices having a nominal leff and larger channel lengths will have a threshold voltage within the range of target threshold voltages. - Additionally, FIG. 3 illustrates that the longer channel lengths tend to have a higher threshold voltage. The shape of
lines tails 21 of thehalo implant 20 overlapping partially or completely, as discussed above with respect to FIG. 2. Thus, FIG. 3 illustrates that even if devices having channel lengths less than 0.05 μm include a halo implant, such devices will not likely produce target threshold voltages (throughout the acceptable channel length tolerance range) regardless of doping concentrations. Thus, the process margin will be very small and the junction leakage will be too high. - Thus, as discussed above, when channel lengths are reduced below 0.05 μm, the distribution tails of the halos tend to overlap, which increases the threshold voltage unacceptably producing the situation known as “Vt roll-off”. The invention reduces the size of the lateral distribution tail of the halo implant so that the distribution tails do not overlap. In order to accomplish this, the invention uses a self-aligned
gate compensation implant 42, as shown in FIG. 4, to counteract the short-channel Vt roll-off. - More specifically, FIG. 4 illustrates a
gate 40, agate oxide layer 41 below thegate 40, asource region 42 and adrain region 43 having ajunction depth 45, achannel length 44, ahalo implant 46, acompensation implant 47 andlateral distribution tails 48. Thecompensation implant 47 is positioned below thegate oxide 41 and is surrounded by thehalo implant 46. The processing steps used to create the structure illustrated in FIG. 4 are discussed below with respect to FIGS. 6-24. - The
compensation implant 47 formed below thegate 40 will reduce the undesirable Vt roll-off. However, a uniform “blanket” compensation implant will equally lower the Vt of MOSFET of all channel lengths. Theinventive compensation implant 47 is different than a “blanket” compensation implant because it is self-aligned with thegate 40. By self-aligning thecompensation implant 47, the implant dose of thecompensation implant 47 will be a function of thegate length 44. - With the self-aligned compensation implant, the compensation dose is lower for a smaller gate length and the threshold voltage reduction is correspondingly lower. For a longer gate length the compensation dose is greater and the threshold voltage is reduced more. In other words, the inventive compensation implant will reduce long channel threshold voltage more than short-channel threshold voltage, and will counteract the Vt roll-off and result in better threshold voltage stability.
- As mentioned above with respect to FIG. 3, a longer channel length will have a higher threshold voltage. The inventive compensation implant matches this characteristic by reducing the threshold voltage more for longer channel lengths and less for shorter channel lengths. Further, the self-aligned nature of the compensation implant permits the variation in doping concentration which adjusts the reduction of the threshold voltage. Therefore, the inventive compensation implant tends to maintain the threshold voltage of semiconductor devices closer to the target threshold voltage because the compensation implant lowers the threshold voltage of devices having higher threshold voltages (e.g., longer channel lengths) more than it lowers the threshold voltages of devices which have lower threshold voltages (e.g., shorter channel lengths).
- This is graphically illustrated in FIG. 5 which is substantially similar to FIG. 3 except for the inclusion of
line 50, which represents the threshold voltage of various devices produced with the inventive self-aligned compensation implant. As demonstrated in FIG. 5, throughout the acceptable variations of channel lengths, the devices with the inventive self-aligned compensation implant exhibit a threshold voltage which is within the target threshold voltage range. - A first preferred method for forming the inventive structure, which, for example, could be a damascene gate process, is illustrated in FIGS.6-11. More specifically, FIG. 6 illustrates the process where a
silicon substrate 60 is formed withdielectric areas 61. Anoxide layer 62 is formed over thesilicon substrate 60. Subsequently a dielectric 63 is formed over theoxide layer 62. Achannel 64 is formed through thedielectric layer 63 and theoxide 62, exposing the surface of thesubstrate 60. - Referring to FIG. 7, nitride, oxide or other
similar spacers 70, are formed in thechannel 64. Subsequently, the inventive self-alignedcompensation implant 71 is formed by an impurity implantation through thechannel 64. For n-type transistors, the donor impurities could include, for example, phosphorus, arsenic and antimony. For p-type transistors, the donor impurities could include, for example, boron, gallium and indium. - In FIG. 8, the self-aligned
compensation implant 71 is covered again with theoxide layer 62 and a conductive material 80 (e.g., gate) over theoxide layer 62. Theconductive material 80 could include, for example, polysilicon or metal. - With respect to FIG. 9, the
dielectric layer 63 and theoxide layer 62 are etched (except for the portion of theoxide layer 62 beneath the conductive layer 80). For example, the etching process could include wet or dry chemical etching. - Referring to FIG. 10 the source/
drain extension implant drain extension implant compensation implant 71. - FIG. 11 shows the more heavily doped
source 110 anddrain regions 111, which are formed in a second heavier doping step. Additionally,oxide spacers 112 are formed adjacent thegate layer 80. - FIGS.6-11 illustrate a process in which the
compensation implant 71 is self-aligned with thegate 80 by thechannel 64. Thechannel 64 defines the location of thecompensation implant 71, thegate oxide layer 62 and thegate 80. Further, thegate 80 defines the source and drainregions channel 64, thecompensation implant 71 will automatically be aligned beneath thegate 80 and will be equally spaced between the source of 110 and thedrain 110 regions. - As discussed above, by having a self-aligned
compensation implant 71, the dose of impurity within thecompensation implant 71 is controlled by the length of thechannel 64. Therefore, alonger channel 64 will allow a higher impurity dosage to be implanted in thecompensation implant 71. Similarly, a shorter channel length will reduce the doping of the compensation implant. As mentioned above, reducing the amount of impurity doping limits the reduction of the threshold voltage. Further, the thickness of thespacer 70 can also be used in a similar way to optimize the dose and energy of the implant. - In FIGS.12-14 another preferred method of the invention is illustrated. More specifically, the method illustrated in FIGS. 12-14 is similar to the method illustrated in FIGS. 6-11. However, FIGS. 12-14 illustrate a more efficient method of forming the compensation implant.
- More specifically, in a similar manner as discussed above with respect to FIG. 6, a
silicon substrate 120 includesdielectric areas 121 and has an oxide layer 122 formed above thesilicon substrate 120 and adielectric layer 123 formed over the gate oxide layer 122. Achannel 124 is formed through thedielectric layer 123 and the oxide layer 122, exposing thesubstrate 120. - As shown in FIG. 13, the
channel 124 is partially filled with a conductingmaterial 130, such as metal or polysilicon. Unlike the process shown in FIG. 7, no spacers are formed in FIG. 12. Further, thecompensation implant 131 is formed by making theconductive layer 130 thin enough to allow an ion implantation to pass. Therefore, in this preferred embodiment, the impurity is implanted directly through theconductive layer 130. In this way, this embodiment is more efficient than the previous embodiment because the steps of forming the nitride spacers 70 (shown in FIG. 7) is eliminated. Further, such a structure minimizes oxidation and enhances diffusion. - As shown in FIG. 14, the remainder of the
channel 124 which was not completely filled by the first layer ofconductive material 130 is filled completely with more of theconductive material 140. The structure is then substantially similar to that shown in FIG. 8 and the processing shown in FIGS. 9-11 is completed on the structure illustrated in FIG. 14, as discussed above. - FIGS.15-20 illustrate the advantages produced by the self-aligned compensation implant. FIGS. 15-20 follow essentially the same method discussed above with respect to FIGS. 6-11. Thus, many of the details have been omitted from FIGS. 15-20 to clearly illustrate how the doping concentration of the self-aligned compensation implant is controlled by the channel length.
- More specifically, FIG. 15 illustrates a structure similar to that shown in FIG. 6, having a dielectric/
oxide layer 151 above asubstrate 150. The dielectric layer has two channels, 152, 153 formed therein. However, because of manufacturing variations, the lengths of thechannels - FIG. 16 illustrates
spacers 160, 161 which respectively line thechannels spacers 160 only line thechannel 152, spacers 161 fill the channel 161. - FIG. 17 illustrates an
ion implantation 170, which is similar to theimplantation 71, shown in FIG. 7. However, FIG. 17 illustrates that thecompensation implant 171 is formed only belowchannel 152 and is not formed inchannel 153 because the spacers 161 block the implant. - FIGS. 18 and 19 illustrates the formation of the
gates 180, 181, as discussed above with respect to FIGS. 8 and 9 and FIG. 20 illustrates the extension/drain implant 200 which is similar to the implant discussed above with respect to FIG. 10. - Therefore, as shown in FIGS.15-20, the length of the channel controls the doping concentration of the
compensation implant 171 by limiting the opening (e.g., 152, 153) through which theimpurity 170 may travel. The impurity concentration is adjusted in this manner to completely prevent the ion implantation, to severely limit ion implantation or to increase ion implantation. - Further, the self-aligned nature of the
compensation implant 171 automatically compensates for manufacturing variations by basing the impurity concentration based on the length of the channel, as discussed above. - FIGS.21-24 similarly demonstrate the advantages of the self-aligned compensation implant and illustrate another embodiment of the invention. More specifically, FIGS. 21-24 illustrate a method of utilizing the channel lengths to control the impurity concentration of the compensation implant.
- FIG. 21 illustrates a
substrate 210, source and drainregions 211, andsacrificial masks 212. Thesacrificial masks 212 are formed to occupy space that will eventually become the conductive gates 240 (FIG. 24). Once again, acceptable variations in manufacturing tolerances are illustrated in the differences in the lengths of thesacrificial masks 212. As with the previous embodiments, these variations will be automatically compensated for by the self-aligned nature of the compensation implant. - In FIG. 22, the
spacers 220 are formed adjacent themasks 212 in a similar manner as thespacers 112, shown in FIG. 11, were formed adjacent theconductive gate 80. - In FIG. 23, the
sacrificial masks 212 have been partially etched to createopenings compensation implant 232 to be formed byimpurity implant 233. More specifically, the etching of thesacrificial masks 212 is halted before all the sacrificial ask material has been removed. - Again, depending upon the variation within the manufacturing process, different sized sacrificial masks will be formed which causes different
sized openings sized openings compensation implant 232. In the example shown in FIG. 23, only one of the openings (e.g, 230) will receive thecompensation implant 233 because theopening 231 in the sacrificial mask did not fully form. However, as discussed above, the impurity concentrations of the compensation implants can vary from a heavy implant, light implant to no implant. - After the doping process and the formation of the compensation implants, the remainder of the
sacrificial masks 212 are removed and thegates 240 are formed, as shown in FIG. 24. More specifically, thegates 240 are selectively deposited, using processes well known to those ordinarily skilled in the art, in the openings between thespacers 220. As with the gates discussed in the previous embodiments, the gates preferably comprise a conductive material, such as metal or polysilicon. - FIGS.21-24 again illustrate that the impurity concentrations of the compensation implants are automatically varied depending upon the channel length because the compensation implants are self-aligned. Therefore, the compensation implants adjust the amount by which the threshold voltage is reduced depending upon the channel length.
- By matching the reduction in threshold voltage to the channel length, the invention substantially eliminates the short channel effect for devices having channel lengths as low as 0.05 μm.
- Thus, with the invention, a channel length which is in the upper range of manufacturing tolerances, which would normally exhibit an increase in threshold voltage will be matched with a more heavily doped compensation implant. As discussed above, the heavier doped compensation implant will cause a larger reduction in threshold voltage and, therefore, counterbalance the increased threshold voltage associated with the larger channel length.
- Similarly, a channel length which is in the lower range of manufacturing tolerances, which would normally exhibit less of an increase in threshold voltage will be matched with a less heavily doped compensation implant. As discussed above, the lighter doped compensation implant will cause a smaller reduction in threshold voltage and, therefore, counterbalance the smaller increase in threshold voltage associated with the smaller channel length.
- Therefore, the self-aligned nature of the inventive compensation implant permits devices having channel lengths as small as 0.05 μm to be produced which do not suffer the adverse effects of threshold voltage roll-off.
- While the invention has been described in terms of preferred embodiments, those skilled in the art will recognize that the invention can be practiced with modification within the spirit and scope of the appended claims.
Claims (25)
1. A semiconductor device comprising:
a gate; and
a compensation implant below said gate.
2. The semiconductor device as in claim 1 , wherein said semiconductor device has an approximately 0.05 μm channel length.
3. The semiconductor device as in claim 1 , wherein said compensation implant reduces a threshold voltage of said semiconductor device.
4. The semiconductor device as in claim 1 , wherein said compensation implant has a doping concentration for controlling a threshold voltage reduction of said semiconductor device.
5. The semiconductor device as in claim 4 , wherein said doping concentration varies depending upon a channel length of said semiconductor device.
6. The semiconductor device as in claim 1 , wherein said compensation implant is self-aligned with said gate.
7. The semiconductor device as in claim 1 , further comprising:
a halo implant surrounding said compensation implant; and
gate and drain regions on opposite sides of said halo implant.
8. A semiconductor device comprising:
a gate;
an oxide layer below said gate;
a self-aligned compensation implant below said oxide layer;
a halo implant surrounding said self-aligned compensation implant below said oxide layer; and
gate and drain regions on opposite sides of said halo implant and below said oxide layer.
9. The semiconductor device as in claim 8 , wherein said self-aligned compensation implant reduces a threshold voltage of said semiconductor device.
10. The semiconductor device as in claim 8 , wherein said self-aligned compensation implant has a doping concentration for controlling a threshold voltage reduction of said semiconductor device that varies depending upon a channel length of said semiconductor device.
11. A method of manufacturing a semiconductor device comprising steps of:
forming a channel above a substrate;
implanting an impurity in said substrate through said channel to form a compensation implant in said semiconductor substrate; and
forming a gate above said compensation implant.
12. The method as in claim 11 , further comprising steps of:
prior to said step of forming said channel, successively depositing an oxide layer and a dielectric layer on said substrate, said step of forming said channel comprising a step of forming said channel in said oxide layer and said dielectric layer;
prior to said step of forming said gate, depositing an oxide layer in said channel on said substrate;
after said step of forming said gate, removing all of said dielectric layer and a portion of said oxide layer such that said oxide layer remains between said gate and said semiconductor substrate; and
doping areas of said semiconductor substrate adjacent said gate to form a halo implant and source and drain regions.
13. The method as in claim 11 , further comprising a step, prior to said implanting step, of forming spacers in said channel.
14. The method as in claim 11 , wherein said implanting step aligns said compensation implant and said gate.
15. The method as in claim 11 , wherein said implanting step further comprises a step of varying a doping concentration of said compensation implant for controlling a threshold voltage reduction of said semiconductor device.
16. The method as in claim 15 , wherein said step of varying a doping concentration of said compensation implant is dependent upon a channel length of said semiconductor device.
17. A method of manufacturing a semiconductor device comprising steps of:
successively depositing an oxide layer and a dielectric layer on a semiconductor substrate;
forming a channel in said oxide layer and said dielectric layer;
forming spacers in said channel;
implanting an impurity in said semiconductor substrate through said channel to form a self-aligned compensation implant in said semiconductor substrate;
depositing an oxide layer in said channel on said semiconductor substrate;
filling said channel with a conductive material to form a gate over said oxide layer;
removing all of said dielectric layer;
removing a portion of said oxide layer such that said oxide layer remains between said gate and said semiconductor substrate; and
doping areas of said semiconductor substrate adjacent said gate to form a halo implant and source and drain regions in said semiconductor substrate.
18. The method as in claim 17 , wherein said implanting step further comprises a step of varying a doping concentration of said self-aligned compensation implant for controlling a threshold voltage reduction of said semiconductor device.
19. The method as in claim 17 , wherein said step of varying a doping concentration of said self-aligned compensation implant is dependent upon a channel length of said semiconductor device.
20. A method of manufacturing a semiconductor device comprising steps of:
successively depositing an oxide layer and a dielectric layer on a semiconductor substrate;
forming a channel in said oxide layer and said dielectric layer;
depositing an oxide layer in said channel on said semiconductor substrate;
partially filling said channel with a conductive material;
implanting an impurity in said semiconductor substrate through said conductive material and said oxide layer in said channel to form a self-aligned compensation implant in said semiconductor substrate;
completely filling said channel with said conductive material to form a gate over said oxide layer;
removing all of said dielectric layer;
removing a portion of said oxide layer such that said oxide layer remains between said gate and said semiconductor substrate; and
doping areas of said semiconductor substrate adjacent said gate to form a halo implant and source and drain regions in said semiconductor substrate.
21. The method as in claim 20 , wherein said implanting step further comprises a step of varying a doping concentration of said self-aligned compensation implant for controlling a threshold voltage reduction of said semiconductor device.
22. The method as in claim 20 , wherein said step of varying a doping concentration of said self-aligned compensation implant is dependent upon a channel length of said semiconductor device.
23. A method of manufacturing a semiconductor device comprising steps of:
forming a sacrificial mask over a gate area of a substrate;
forming spacers adjacent said sacrificial mask;
forming an opening in said sacrificial mask;
implanting an impurity in said semiconductor substrate through said opening in said sacrificial mask to form a self-aligned compensation implant in said semiconductor substrate;
removing said sacrificial mask;
depositing an oxide layer between said spacers on said semiconductor substrate;
forming a gate between said spacers and over said oxide layer; and
doping areas of said semiconductor substrate adjacent said gate to form a halo implant and source and drain regions in said semiconductor substrate.
24. The method as in claim 23 , wherein said implanting step further comprises a step of varying a doping concentration of said self-aligned compensation implant for controlling a threshold voltage reduction of said semiconductor device.
25. The method as in claim 23 , wherein said step of varying a doping concentration of said self-aligned compensation implant is dependent upon a channel length of said semiconductor device.
Priority Applications (1)
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US10/641,522 US20040033665A1 (en) | 1998-07-13 | 2003-08-15 | Structure and method of controlling short-channel effect of very short channel MOSFET |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US09/114,502 US6653686B2 (en) | 1998-07-13 | 1998-07-13 | Structure and method of controlling short-channel effect of very short channel MOSFET |
US10/641,522 US20040033665A1 (en) | 1998-07-13 | 2003-08-15 | Structure and method of controlling short-channel effect of very short channel MOSFET |
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US09/114,502 Division US6653686B2 (en) | 1998-07-13 | 1998-07-13 | Structure and method of controlling short-channel effect of very short channel MOSFET |
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US09/114,502 Expired - Fee Related US6653686B2 (en) | 1998-07-13 | 1998-07-13 | Structure and method of controlling short-channel effect of very short channel MOSFET |
US10/641,522 Abandoned US20040033665A1 (en) | 1998-07-13 | 2003-08-15 | Structure and method of controlling short-channel effect of very short channel MOSFET |
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US09/114,502 Expired - Fee Related US6653686B2 (en) | 1998-07-13 | 1998-07-13 | Structure and method of controlling short-channel effect of very short channel MOSFET |
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US (2) | US6653686B2 (en) |
JP (1) | JP3396841B2 (en) |
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TW (1) | TWI234849B (en) |
Cited By (2)
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US20060255375A1 (en) * | 2005-05-12 | 2006-11-16 | International Business Machines Corporation | Anti-halo compensation |
US20070054480A1 (en) * | 2005-09-12 | 2007-03-08 | International Business Machines Corporation | Anti-halo compensation |
Families Citing this family (8)
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US6756619B2 (en) * | 2002-08-26 | 2004-06-29 | Micron Technology, Inc. | Semiconductor constructions |
US6911695B2 (en) * | 2002-09-19 | 2005-06-28 | Intel Corporation | Transistor having insulating spacers on gate sidewalls to reduce overlap between the gate and doped extension regions of the source and drain |
KR100546334B1 (en) * | 2003-07-01 | 2006-01-26 | 삼성전자주식회사 | Integrated circuit semiconductor device having different impurity concentration in respective regions of a semiconductor wafer, and fabrication method thereof |
US7956415B2 (en) * | 2008-06-05 | 2011-06-07 | International Business Machines Corporation | SOI transistor having a carrier recombination structure in a body |
US7883944B2 (en) * | 2009-03-19 | 2011-02-08 | International Business Machines Corporation | Ultra-thin semiconductor on insulator metal gate complementary field effect transistor with metal gate and method of forming thereof |
US8138029B2 (en) * | 2010-01-13 | 2012-03-20 | International Business Machines Corporation | Structure and method having asymmetrical junction or reverse halo profile for semiconductor on insulator (SOI) metal oxide semiconductor field effect transistor (MOSFET) |
US8343818B2 (en) | 2010-01-14 | 2013-01-01 | International Business Machines Corporation | Method for forming retrograded well for MOSFET |
US8900954B2 (en) | 2011-11-04 | 2014-12-02 | International Business Machines Corporation | Blanket short channel roll-up implant with non-angled long channel compensating implant through patterned opening |
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Also Published As
Publication number | Publication date |
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JP3396841B2 (en) | 2003-04-14 |
US6653686B2 (en) | 2003-11-25 |
US20020056873A1 (en) | 2002-05-16 |
KR100355638B1 (en) | 2002-10-09 |
KR20000011295A (en) | 2000-02-25 |
TWI234849B (en) | 2005-06-21 |
JP2000049333A (en) | 2000-02-18 |
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