DE60230838D1 - Verfahren zur Herstellung einer Microstruktur - Google Patents

Verfahren zur Herstellung einer Microstruktur

Info

Publication number
DE60230838D1
DE60230838D1 DE60230838T DE60230838T DE60230838D1 DE 60230838 D1 DE60230838 D1 DE 60230838D1 DE 60230838 T DE60230838 T DE 60230838T DE 60230838 T DE60230838 T DE 60230838T DE 60230838 D1 DE60230838 D1 DE 60230838D1
Authority
DE
Germany
Prior art keywords
positive type
resist layer
type resist
image
pmipk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60230838T
Other languages
English (en)
Inventor
Masashi Miyagawa
Masahiko Kubota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60230838D1 publication Critical patent/DE60230838D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1637—Manufacturing processes molding
    • B41J2/1639—Manufacturing processes molding sacrificial molding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1601—Production of bubble jet print heads
    • B41J2/1603—Production of bubble jet print heads of the front shooter type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1631—Manufacturing processes photolithography
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49128—Assembling formed circuit to base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
    • Y10T29/49131—Assembling to base an electrical component, e.g., capacitor, etc. by utilizing optical sighting device
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49169—Assembling electrical component directly to terminal or elongated conductor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet
DE60230838T 2001-07-11 2002-07-10 Verfahren zur Herstellung einer Microstruktur Expired - Lifetime DE60230838D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001210933A JP4532785B2 (ja) 2001-07-11 2001-07-11 構造体の製造方法、および液体吐出ヘッドの製造方法

Publications (1)

Publication Number Publication Date
DE60230838D1 true DE60230838D1 (de) 2009-03-05

Family

ID=19046331

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60230838T Expired - Lifetime DE60230838D1 (de) 2001-07-11 2002-07-10 Verfahren zur Herstellung einer Microstruktur

Country Status (5)

Country Link
US (2) US6960424B2 (de)
EP (1) EP1275508B1 (de)
JP (1) JP4532785B2 (de)
AT (1) ATE420769T1 (de)
DE (1) DE60230838D1 (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4078070B2 (ja) * 2000-12-28 2008-04-23 キヤノン株式会社 インクジェットヘッドの製造方法
JP4095368B2 (ja) 2001-08-10 2008-06-04 キヤノン株式会社 インクジェット記録ヘッドの作成方法
JP4280574B2 (ja) 2002-07-10 2009-06-17 キヤノン株式会社 液体吐出ヘッドの製造方法
JP3862624B2 (ja) * 2002-07-10 2006-12-27 キヤノン株式会社 液体吐出ヘッドおよび、該ヘッドの製造方法
JP2004042389A (ja) * 2002-07-10 2004-02-12 Canon Inc 微細構造体の製造方法、液体吐出ヘッドの製造方法および液体吐出ヘッド
JP3890268B2 (ja) * 2002-07-10 2007-03-07 キヤノン株式会社 液体吐出ヘッドおよび、該ヘッドの製造方法
JP2005074747A (ja) * 2003-08-29 2005-03-24 Canon Inc インクジェットヘッドの製造方法およびインクジェットヘッド
DE10353767B4 (de) * 2003-11-17 2005-09-29 Infineon Technologies Ag Vorrichtung zur Häusung einer mikromechanischen Struktur und Verfahren zur Herstellung derselben
JP4455287B2 (ja) * 2003-12-26 2010-04-21 キヤノン株式会社 インクジェット記録ヘッドの製造方法
ATE529901T1 (de) * 2004-02-27 2011-11-15 Canon Kk Piezoelektrischer dünnfilm, verfahren zur herstellung eines piezoelektrischen dünnfilms, piezoelektrisches element und inkjet- aufzeichnungskopf
JP4480141B2 (ja) * 2004-06-28 2010-06-16 キヤノン株式会社 インクジェット記録ヘッドの製造方法
CN1977219B (zh) * 2004-06-28 2011-12-28 佳能株式会社 制造微细结构的方法、制造排液头的方法以及排液头
JP4761498B2 (ja) * 2004-06-28 2011-08-31 キヤノン株式会社 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法
WO2006001530A2 (en) 2004-06-28 2006-01-05 Canon Kabushiki Kaisha Liquid discharge head manufacturing method, and liquid discharge head obtained using this method
CN1968815B (zh) 2004-06-28 2013-05-01 佳能株式会社 排液头制造方法，和使用该方法得到的排液头
JP4533256B2 (ja) * 2004-06-28 2010-09-01 キヤノン株式会社 微細構造体の製造方法および液体吐出ヘッドの製造方法
US7370944B2 (en) * 2004-08-30 2008-05-13 Eastman Kodak Company Liquid ejector having internal filters
JP5027991B2 (ja) * 2004-12-03 2012-09-19 キヤノン株式会社 インクジェットヘッドおよびその製造方法
KR20060071228A (ko) * 2004-12-21 2006-06-26 동부일렉트로닉스 주식회사 반도체 소자의 패턴 및 그 형성방법
JP4241605B2 (ja) * 2004-12-21 2009-03-18 ソニー株式会社 液体吐出ヘッドの製造方法
JP4724490B2 (ja) * 2005-08-09 2011-07-13 キヤノン株式会社 液体吐出ヘッド
KR101012898B1 (ko) 2005-12-02 2011-02-08 캐논 가부시끼가이샤 액체 토출 헤드 제조 방법
JP4845692B2 (ja) * 2005-12-02 2011-12-28 キヤノン株式会社 液体吐出ヘッドの製造方法
US8037603B2 (en) * 2006-04-27 2011-10-18 Canon Kabushiki Kaisha Ink jet head and producing method therefor
JP4974751B2 (ja) * 2006-04-27 2012-07-11 キヤノン株式会社 インクジェットヘッドおよびその製造方法
US7980675B2 (en) * 2006-05-02 2011-07-19 Canon Kabushiki Kaisha Ink jet head
JP5094290B2 (ja) * 2006-09-08 2012-12-12 キヤノン株式会社 液体吐出ヘッドの製造方法
US8376525B2 (en) 2006-09-08 2013-02-19 Canon Kabushiki Kaisha Liquid discharge head and method of manufacturing the same
JP2009119650A (ja) * 2007-11-13 2009-06-04 Canon Inc インクジェットヘッドの製造方法
US20090136875A1 (en) * 2007-11-15 2009-05-28 Canon Kabushiki Kaisha Manufacturing method of liquid ejection head
JP2010131954A (ja) * 2007-12-19 2010-06-17 Canon Inc 液体吐出ヘッドの製造方法
KR101452705B1 (ko) * 2008-01-10 2014-10-24 삼성전자주식회사 잉크젯 프린터 헤드의 제조 방법 및 상기 방법에 의하여제조된 잉크젯 프린터 헤드
JP2009220286A (ja) * 2008-03-13 2009-10-01 Canon Inc 液体吐出記録ヘッド及その製造方法
KR101249580B1 (ko) 2008-05-22 2013-04-01 캐논 가부시끼가이샤 액체 토출 헤드 및 액체 토출 헤드의 제조 방법
US8499453B2 (en) * 2009-11-26 2013-08-06 Canon Kabushiki Kaisha Method of manufacturing liquid discharge head, and method of manufacturing discharge port member
US8434229B2 (en) * 2010-11-24 2013-05-07 Canon Kabushiki Kaisha Liquid ejection head manufacturing method
JP2012121168A (ja) * 2010-12-06 2012-06-28 Canon Inc 液体吐出ヘッド及びその製造方法
FR2974194B1 (fr) * 2011-04-12 2013-11-15 Commissariat Energie Atomique Procede de lithographie
JP5854682B2 (ja) * 2011-07-27 2016-02-09 キヤノン株式会社 記録ヘッドとその製造方法
JP5410488B2 (ja) * 2011-09-27 2014-02-05 富士フイルム株式会社 インクジェットヘッドおよびインクジェット記録装置
US10194537B2 (en) * 2013-03-25 2019-01-29 International Business Machines Corporation Minimizing printed circuit board warpage
JP6327836B2 (ja) * 2013-11-13 2018-05-23 キヤノン株式会社 液体吐出ヘッドの製造方法

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5595324A (en) * 1978-12-30 1980-07-19 Fujitsu Ltd Manufacturing method of semiconductor device
JPS56162744A (en) * 1980-05-19 1981-12-14 Hitachi Ltd Formation of fine pattern
US4609427A (en) * 1982-06-25 1986-09-02 Canon Kabushiki Kaisha Method for producing ink jet recording head
JPH0645242B2 (ja) 1984-12-28 1994-06-15 キヤノン株式会社 液体噴射記録ヘツドの製造方法
JPS62127735A (ja) * 1985-11-29 1987-06-10 Toshiba Corp 感光性樹脂組成物及びこれを用いたカラ−フイルタ−の製造方法
JPH0698755B2 (ja) * 1986-04-28 1994-12-07 キヤノン株式会社 液体噴射記録ヘツドの製造方法
US4882595A (en) 1987-10-30 1989-11-21 Hewlett-Packard Company Hydraulically tuned channel architecture
JPH0740808B2 (ja) 1990-10-17 1995-05-10 井関農機株式会社 トラクターの油圧昇降制御装置
JPH04194939A (ja) * 1990-11-27 1992-07-14 Matsushita Electric Ind Co Ltd マスク形成方法およびパターン形成方法
JP2694054B2 (ja) * 1990-12-19 1997-12-24 キヤノン株式会社 液体噴射記録ヘッド、その製造方法、及び液体噴射記録ヘッドを備えた記録装置
EP0491560B1 (de) 1990-12-19 1997-10-01 Canon Kabushiki Kaisha Herstellungsverfahren für flüssigkeitsausströmenden Aufzeichnungskopf
ATE196199T1 (de) * 1992-06-01 2000-09-15 Canon Kk Verfahren zur herstellung eines tintenstrahlaufzeichnungskopfes
JP2960608B2 (ja) * 1992-06-04 1999-10-12 キヤノン株式会社 液体噴射記録ヘッドの製造方法
JPH0645242A (ja) 1992-07-24 1994-02-18 Hitachi Ltd レジスト塗布方法及びその装置
JP3143307B2 (ja) 1993-02-03 2001-03-07 キヤノン株式会社 インクジェット記録ヘッドの製造方法
JPH07156409A (ja) * 1993-10-04 1995-06-20 Xerox Corp 一体形成した流路構造を有するインクジェット・プリントヘッドおよびその作製方法
JP3143308B2 (ja) 1994-01-31 2001-03-07 キヤノン株式会社 インクジェット記録ヘッドの製造方法
EP0734866B1 (de) 1995-03-31 1999-08-11 Canon Kabushiki Kaisha Verfahren zum Herstellen eines Tintenstrahlkopfes
JPH09109392A (ja) 1995-10-13 1997-04-28 Canon Inc インクジェット記録ヘッドの製造方法および同方法により製造されたインクジェット記録ヘッド、並びにインクジェット記録装置
EP0800921B1 (de) 1996-04-12 2005-02-02 Canon Kabushiki Kaisha Tintenstrahldruckkopfherstellungsverfahren
US6158843A (en) 1997-03-28 2000-12-12 Lexmark International, Inc. Ink jet printer nozzle plates with ink filtering projections
DE69819976T2 (de) 1997-08-05 2004-09-02 Canon K.K. Flüssigkeitsausstosskopf, Substrat und Herstelllungsverfahren
JPH11227210A (ja) * 1997-12-05 1999-08-24 Canon Inc 液体吐出ヘッド、該ヘッドの製造方法、ヘッドカートリッジおよび液体吐出装置
JP2000198199A (ja) * 1997-12-05 2000-07-18 Canon Inc 液体吐出ヘッドおよびヘッドカートリッジおよび液体吐出装置および液体吐出ヘッドの製造方法
EP1020291A3 (de) * 1999-01-18 2001-04-11 Canon Kabushiki Kaisha Flüssigkeitsausstosskopf und Verfahren zur Herstellung desselben
US6447984B1 (en) 1999-02-10 2002-09-10 Canon Kabushiki Kaisha Liquid discharge head, method of manufacture therefor and liquid discharge recording apparatus
JP4497633B2 (ja) * 1999-03-15 2010-07-07 キヤノン株式会社 撥液体層の形成方法及び液体吐出ヘッドの製造方法
US6474769B1 (en) * 1999-06-04 2002-11-05 Canon Kabushiki Kaisha Liquid discharge head, liquid discharge apparatus and method for manufacturing liquid discharge head
ES2209723T3 (es) * 1999-06-04 2004-07-01 Canon Kabushiki Kaisha Metodo de fabricacion de un cabezal para descarga de liquido, cabezal para descarga de liquido fabricado por dicho metodo y metodo de fabricacion de un aparato mecanico miniatura.
US6426481B1 (en) 1999-06-29 2002-07-30 Canon Kabushiki Kaisha Method for manufacturing discharge nozzle of liquid jet recording head and method for manufacturing the same head
US6569343B1 (en) * 1999-07-02 2003-05-27 Canon Kabushiki Kaisha Method for producing liquid discharge head, liquid discharge head, head cartridge, liquid discharging recording apparatus, method for producing silicon plate and silicon plate
JP2001018395A (ja) * 1999-07-02 2001-01-23 Canon Inc 液体吐出ヘッドおよびその製造方法
US6472125B1 (en) * 1999-11-30 2002-10-29 Canon Kabushiki Kaisha Method for manufacturing ink jet recording head and ink jet recording head manufactured by such method of manufacture
JP4078070B2 (ja) * 2000-12-28 2008-04-23 キヤノン株式会社 インクジェットヘッドの製造方法
JP2004042389A (ja) * 2002-07-10 2004-02-12 Canon Inc 微細構造体の製造方法、液体吐出ヘッドの製造方法および液体吐出ヘッド

Also Published As

Publication number Publication date
JP2003025595A (ja) 2003-01-29
EP1275508A2 (de) 2003-01-15
JP4532785B2 (ja) 2010-08-25
US6960424B2 (en) 2005-11-01
US20030011655A1 (en) 2003-01-16
US20050181309A1 (en) 2005-08-18
EP1275508B1 (de) 2009-01-14
ATE420769T1 (de) 2009-01-15
EP1275508A3 (de) 2003-07-16
US7526863B2 (en) 2009-05-05

Similar Documents

Publication Publication Date Title
DE60230838D1 (de) Verfahren zur Herstellung einer Microstruktur
TW200801801A (en) Process for producing patterned film and photosensitive resin composition
US4983252A (en) Process for producing printed circuit board
KR100566700B1 (ko) 반도체 공정에서 포토레지스트 패턴 형성 방법,포토레지스트 패턴 형성용 템플레이트 및 이의 제조 방법.
KR101770809B1 (ko) 임프린트법에 의한 폴리이미드의 미세 패턴 형성 방법
EP1564565A3 (de) Optischer Wellenleiter und Herstellungsmethode
CA2376283A1 (en) Method of manufacturing an intracutaneous microneedle array
ATE544095T1 (de) Verfahren zur herstellung einer druckplatte
WO2009078380A1 (ja) ネガ型感光性樹脂積層体を用いたレジスト硬化物の製造方法、ネガ型感光性樹脂積層体、及びネガ型感光性樹脂積層体の使用方法
DE602005017972D1 (de) Verfahren zur Erzeugung eines Musters
ATE527109T1 (de) Verfahren zur herstellung eines lasergravierbaren druckträgers
KR20100033311A (ko) 나노 임프린트를 이용한 패턴 성형방법과 패턴 성형을 위한몰드 제작방법
ATE388821T1 (de) Verfahren zur herstellung einer lithographischen druckplatte
TW200617596A (en) Composition for organic membrane and method for forming resist pattern
WO2005005121A3 (en) A method of manufacturing a mould for producing an optical surface, a method of producing a contact lens and a device for use with these methods
DE69515571T2 (de) Verfahren zur Herstellung eines mit einer feinstrukturierten Nesa-Glas-Membrane beschichteten Glassubstrats
ATE517758T1 (de) Verfahren zur herstellung einer lithografiedruckform
ATE426191T1 (de) Verfahren zur herstellung einer lithographischen druckplatte
TWI261127B (en) Die for molding optical panel, process for production thereof, and use thereof
DE602004025041D1 (de) Verfahren zur erzeugung einer vertiefung in einer oberfläche einer schicht aus fotoresist
TW200506549A (en) Method for making mold of light guide plate
US20050181313A1 (en) Method for forming openings in a substrate using a packing and unpacking process
KR20060046579A (ko) 광도파로의 작성 방법
ATE378172T1 (de) Verfahren zur herstellung einer lithographischen druckplatte
KR20210014991A (ko) 나노-마이크로 복합 패턴을 갖는 데코 필름 및 제작 방법

Legal Events

Date Code Title Description
8364 No opposition during term of opposition