CN102592972A - Cleaning method of solar battery silicon chip - Google Patents
Cleaning method of solar battery silicon chip Download PDFInfo
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- CN102592972A CN102592972A CN2012100176620A CN201210017662A CN102592972A CN 102592972 A CN102592972 A CN 102592972A CN 2012100176620 A CN2012100176620 A CN 2012100176620A CN 201210017662 A CN201210017662 A CN 201210017662A CN 102592972 A CN102592972 A CN 102592972A
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 166
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 166
- 239000010703 silicon Substances 0.000 title claims abstract description 166
- 238000004140 cleaning Methods 0.000 title claims abstract description 76
- 238000000034 method Methods 0.000 title claims abstract description 49
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 32
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 13
- RBNWAMSGVWEHFP-UHFFFAOYSA-N trans-p-Menthane-1,8-diol Chemical compound CC(C)(O)C1CCC(C)(O)CC1 RBNWAMSGVWEHFP-UHFFFAOYSA-N 0.000 claims description 9
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 abstract description 21
- 239000002184 metal Substances 0.000 abstract description 21
- 239000003960 organic solvent Substances 0.000 abstract description 21
- 239000000843 powder Substances 0.000 abstract description 5
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 abstract 1
- 230000009286 beneficial effect Effects 0.000 abstract 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 229940116411 terpineol Drugs 0.000 abstract 1
- 210000004027 cell Anatomy 0.000 description 124
- 239000002002 slurry Substances 0.000 description 22
- 239000000428 dust Substances 0.000 description 18
- 239000007795 chemical reaction product Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 235000008216 herbs Nutrition 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 210000002268 wool Anatomy 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000002000 scavenging effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000002547 anomalous effect Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention provides a cleaning method of a solar battery silicon chip, which comprises the following steps of: cleaning the solar battery silicon chip by adopting alcohol or terpineol to obtain the preliminarily-cleaned solar battery silicon chip; cleaning the preliminarily-cleaned solar battery silicon chip by adopting alkaline cleaner solution to obtain the alkaline-cleaned solar battery silicon chip; cleaning the alkaline-cleaned solar battery silicon chip by adopting water; cleaning the water-cleaned solar battery silicon chip by adopting hydrogen peroxide solution; and cleaning the hydrogen peroxide solution-cleaned solar battery silicon chip by adopting water to obtain the solar battery silicon chip which is more cleanly cleaned. The cleaning method of the solar battery silicon chip has the beneficial effect that metal powder and an organic solvent remaining on the surface of the solar battery silicon chip are respectively removed by the alkaline cleaner solution and the hydrogen peroxide solution, so that the metal powder and the organic solvent remaining on the surface of the solar battery silicon chip are reduced, and the reutilization rate of the solar battery silicon chip with unqualified printing paste is improved.
Description
Technical field
The present invention relates to silicon chip cleaning technique field in the manufacture of solar cells process, more particularly, relate to a kind of cleaning method of silicon chip of solar cell.
Background technology
Solar cell is the device that directly luminous energy is changed into electric energy through photoelectric effect.The main technique flow process of making solar cell is: making herbs into wool, diffusion, peripheral etching, PECVD (plasma enhanced chemical vapor deposition, Plasma Enhanced Chemical Vapor Deposition) and printing sintering.
In the printing sintering process, slurry is printed on the silicon chip front and back, form electrode behind the sintering, be used for the collection of electric charge, help the welding of assembly simultaneously.
Slurry is meant by silver powder, aluminium powder and inorganic bond frit, and organic carrier is formed with other additives, and wherein organic carrier comprises organic solvent and organic resin.
Based on the function of solar cell, strict to the surface quality requirement of solar cell.In the printing sintering process behind the printing slurry, if silicon chip surface has flaw, spot for example; Printed patterns is imperfect etc., and promptly this silicon chip printing slurry is defective, and it is defective to need to print slurry; Be that surperficial silicon chip defective is chosen and is used as utilizing sheet again, put into production again.Utilize sheet to be in the manufacture of solar cells process again, reason causes the surface quality of silicon chip to be affected because equipment fault, peripheral condition ANOMALOUS VARIATIONS, silicon chip be contaminated etc., need restart the silicon chip of manufacture craft.Utilize silicon chip to remove thickness again and there are differences, do not have difference qualitatively with normal silicon chip.
Because there is slurry in the silicon chip surface after the printing, need the slurry of silicon chip surface be cleaned up just can put into production again, beginning making herbs into wool.At present,, adopt alcohol and non-dust cloth to clean, can most of slurry be washed for the underproof silicon chip of surface quality behind the printing slurry.But metal dust that slurry contains and organic solvent part can not be dissolved in alcohol, can cause using alcohol scrub fully attached to silicon chip surface.The silicon chip of wiped clean not; Be the silicon chip that surface attachment has metal dust and organic solvent, put into production, a large amount of underproof silicon chips can occur after the making herbs into wool; Had a strong impact on the qualification rate of finished product, the utilance again that finally causes printing the underproof silicon chip of slurry is lower.
In sum; How a kind of cleaning method of silicon chip of solar cell is provided; Reduce the metal dust and the organic solvent that remain in the silicon chip of solar cell surface; And then improve the utilance again of printing the underproof silicon chip of solar cell of slurry, be present those skilled in the art's problem demanding prompt solution.
Summary of the invention
In view of this, the invention provides a kind of cleaning method of silicon chip of solar cell, reduced the metal dust and the organic solvent that remain in the silicon chip of solar cell surface, and then improved the utilance again of the underproof silicon chip of solar cell of printing slurry.
In order to achieve the above object, the present invention provides following technical scheme:
A kind of cleaning method of silicon chip of solar cell comprises:
1) adopt alcohol or terpinol to clean said silicon chip of solar cell, the silicon chip of solar cell that is tentatively cleaned;
2) adopt alkaline cleaner solution that the silicon chip of solar cell of said preliminary cleaning is cleaned, obtain the silicon chip of solar cell that alkalescence is cleaned;
3) silicon chip of solar cell that adopts water that said alkalescence is cleaned cleans;
4) adopt hydrogen peroxide solution that the said silicon chip of solar cell that water cleans is cleaned;
5) adopt water that the said silicon chip of solar cell that cleans through said hydrogen peroxide solution is cleaned, obtain the said silicon chip of solar cell that cleans totallyer.
Preferably, in the cleaning method of above-mentioned silicon chip of solar cell, said step 2) also comprise: in said alkaline cleaner solution, add ultrasonic wave, carry out ultrasonic cleaning.
Preferably, in the cleaning method of above-mentioned silicon chip of solar cell, said step 2) in, in the said alkaline cleaner solution, the volume ratio of pure water and alkaline cleaner is between 7.5: 1 and 15: 1.
Preferably, in the cleaning method of above-mentioned silicon chip of solar cell, said step 2) in, adopt time that said alkaline cleaner solution cleans said silicon chip of solar cell between 30-150min.
Preferably, in the cleaning method of above-mentioned silicon chip of solar cell, said step 2) in, the silicon chip of solar cell of said preliminary cleaning is put into slide cassette clean, in said alkaline cleaner solution, add ultrasonic wave through ultrasonic generator.
Preferably, in the cleaning method of above-mentioned silicon chip of solar cell, in the said step 4), the mass concentration of hydrogen peroxide solution is between 5%-30% in the said hydrogen peroxide solution.
Preferably, in the cleaning method of above-mentioned silicon chip of solar cell, in the said step 4), adopt time that said hydrogen peroxide solution cleans said silicon chip of solar cell between 30-75min.
Preferably, in the cleaning method of above-mentioned silicon chip of solar cell, in said step 3) and/or the step 5), being specially through the mode of submergence or spray of said cleaning cleaned.
The cleaning method of silicon chip of solar cell provided by the invention comprises: adopt alcohol or terpinol cleaning solar energy cell silicon chip, the silicon chip of solar cell that is tentatively cleaned; Adopt alkaline cleaner solution that the silicon chip of solar cell of preliminary cleaning is cleaned, obtain the silicon chip of solar cell that alkalescence is cleaned; The silicon chip of solar cell that adopts water that alkalescence is cleaned cleans; Adopt hydrogen peroxide solution that the silicon chip of solar cell that water cleans is cleaned; Adopt water that the silicon chip of solar cell that cleans through hydrogen peroxide solution is cleaned, obtain the said silicon chip of solar cell that cleans totallyer.
The cleaning method of silicon chip of solar cell provided by the invention; Compared with prior art; Increased the cleaning of alkaline cleaner solution and hydrogen peroxide solution; Alkaline cleaner solution can be with the metal dust reaction that remains in silicon chip of solar cell surface and with its dissolving, water cleaning solar energy cell silicon chip then, and then can remove the metal dust that remains in the silicon chip of solar cell surface; Hydrogen peroxide solution can be with the oxidation in organic solvent that remains in the silicon chip of solar cell surface and with its dissolving; Water cleaning solar energy cell silicon chip then; And then can remove the organic solvent that remains in the silicon chip of solar cell surface; Promptly obtain the silicon chip of solar cell that cleans totallyer; Finally reduce the metal dust and the organic solvent that remain in the silicon chip of solar cell surface, and then improved the utilance again of the underproof silicon chip of solar cell of printing slurry.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art; To do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below; Obviously, the accompanying drawing in describing below only is some embodiments of the present invention, for those of ordinary skills; Under the prerequisite of not paying creative work, can also obtain other accompanying drawing according to these accompanying drawings.
The schematic flow sheet of the embodiment one of the cleaning method of the silicon chip of solar cell that Fig. 1 provides for the embodiment of the invention;
The schematic flow sheet of the embodiment two of the cleaning method of the silicon chip of solar cell that Fig. 2 provides for the embodiment of the invention.
Embodiment
For quote and know for the purpose of, now the technical term that relates in this patent is explained as follows:
Alkaline cleaner: a kind of cleaning agent commonly used mainly comprises caustic alkali, phosphate, silicate, carbonate, chelating agent and surfactant.
Ultrasonic cleaning: act on cleaning solution with ultrasonic wave, so that more effectively remove the greasy dirt of surface of the work and the cleaning method of other impurity.
The invention provides a kind of cleaning method of silicon chip of solar cell, reduced the metal dust and the organic solvent that remain in the silicon chip of solar cell surface, and then improved the utilance again of the underproof silicon chip of solar cell of printing slurry.
To combine the accompanying drawing in the embodiment of the invention below, the technical scheme in the embodiment of the invention is carried out clear, intactly description, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the present invention's protection.
Please refer to accompanying drawing 1-2, the schematic flow sheet of the embodiment one of the cleaning method of the silicon chip of solar cell that Fig. 1 provides for the embodiment of the invention; The schematic flow sheet of the embodiment two of the cleaning method of the silicon chip of solar cell that Fig. 2 provides for the embodiment of the invention.
Please with reference to accompanying drawing 1, the schematic flow sheet of the embodiment one of the cleaning method of the silicon chip of solar cell that Fig. 1 provides for the embodiment of the invention, concrete grammar is following:
S101) adopt alcohol or terpinol cleaning solar energy cell silicon chip, the silicon chip of solar cell that is tentatively cleaned:
Most of material in the slurry can be dissolved in alcohol or terpinol, adopts that alcohol or terpinol are capable of washing to fall most of slurry, but part metals powder in the slurry and organic solvent can remain in the surface of silicon chip of solar cell;
S102) adopt alkaline cleaner solution that the silicon chip of solar cell of preliminary cleaning is cleaned, obtain the silicon chip of solar cell that alkalescence is cleaned:
Alkaline cleaner solution can react and make that with the metal dust that remains in the silicon chip of solar cell surface reaction product is dissolved in the alkaline cleaner solution, and then has removed the metal dust on silicon chip of solar cell surface;
S103) silicon chip of solar cell that adopts water that alkalescence is cleaned cleans:
Water cleaning solar energy cell silicon chip, flush away remain in the alkaline cleaner solution on silicon chip of solar cell surface and are dissolved in the reaction product in the alkaline cleaner solution;
S104) adopt hydrogen peroxide solution that the silicon chip of solar cell that water cleans is cleaned:
Hydrogen peroxide solution has strong oxidizing property, can be dissolved in the hydrogen peroxide solution with the oxidation in organic solvent that remains in the silicon chip of solar cell surface and with reaction product, and then can remove the organic solvent on silicon chip of solar cell surface;
S105) adopt water that the silicon chip of solar cell that cleans through hydrogen peroxide solution is cleaned, obtain the silicon chip of solar cell that cleans totallyer:
Water cleaning solar energy cell silicon chip, flush away remain in the hydrogen peroxide solution of solar cell surface and are dissolved in the reaction product in the hydrogen peroxide solution, have finally obtained the silicon chip of solar cell that cleans totallyer, can produce again and utilize.
The cleaning method of the silicon chip of solar cell that the embodiment of the invention provides; Compared with prior art; Increased the cleaning of alkaline cleaner solution and hydrogen peroxide solution; Alkaline cleaner solution can be with the metal dust reaction that remains in silicon chip of solar cell surface and with its dissolving, water cleaning solar energy cell silicon chip then, and then can remove the metal dust that remains in the silicon chip of solar cell surface; Hydrogen peroxide solution can be with the oxidation in organic solvent that remains in the silicon chip of solar cell surface and with its dissolving; Water cleaning solar energy cell silicon chip then; And then can remove the organic solvent that remains in the silicon chip of solar cell surface; Promptly obtain the silicon chip of solar cell that cleans totallyer; Finally reduce the metal dust and the organic solvent that remain in the silicon chip of solar cell surface, and then improved the utilance again of the underproof silicon chip of solar cell of printing slurry.
Preferably, in the cleaning method of the silicon chip of solar cell that the foregoing description provides, step S104) in, the mass concentration of hydrogen peroxide solution is between 5%-30% in the hydrogen peroxide solution.Certainly, the concentration of hydrogen peroxide solution also can be other numerical value in the hydrogen peroxide solution, as long as can guarantee that hydrogen peroxide solution washes organic solvent, the present invention does not limit this particularly.
Preferably, in the cleaning method of the silicon chip of solar cell that the foregoing description provides, step S104) in, adopt time that hydrogen peroxide solution cleans silicon chip of solar cell between 30-75min.The time that hydrogen peroxide solution cleans is relevant with the mass concentration of hydrogen peroxide solution, and mass concentration is high more, and required scavenging period is short more.
Preferably, in the cleaning method of the silicon chip of solar cell that the foregoing description provides, said step S103) and/or step S105) in, being specially through the mode of submergence or spray of cleaning cleaned.Certainly, the present invention does not limit the mode of water cleaning solar energy cell silicon chip particularly, can the solution that remain in the silicon chip of solar cell surface be cleaned up as long as can guarantee water.
Please with reference to accompanying drawing 2, the schematic flow sheet of the embodiment two of the cleaning method of the silicon chip of solar cell that Fig. 2 provides for the embodiment of the invention, concrete grammar is following:
S201) adopt alcohol or terpinol cleaning solar energy cell silicon chip, the silicon chip of solar cell that is tentatively cleaned:
Most of material in the slurry can be dissolved in alcohol or terpinol, adopts that alcohol or terpinol are capable of washing to fall most of slurry, but part metals powder in the slurry and organic solvent can remain in the surface of silicon chip of solar cell;
The silicon chip of solar cell that S202) will tentatively clean is put into slide cassette, adopts the hyperacoustic alkaline cleaner solution of adding that the silicon chip of solar cell of preliminary cleaning is carried out ultrasonic cleaning, obtains the silicon chip of solar cell that alkalescence is cleaned:
Alkaline cleaner solution can react and make reaction product to be dissolved in the alkaline cleaner solution with the metal dust that remains in the silicon chip of solar cell surface; And then removed the metal dust on silicon chip of solar cell surface; Simultaneously, adopt ultrasonic cleaning, can make alkaline cleaner solution impact consumingly silicon chip of solar cell and on metal dust; Get final product the intensified response effect, and then strengthened the cleaning performance of alkaline cleaner solution;
S203) silicon chip of solar cell that adopts water that alkalescence is cleaned cleans:
Water cleaning solar energy cell silicon chip, flush away remain in the alkaline cleaner solution on silicon chip of solar cell surface and are dissolved in the reaction product in the alkaline cleaner solution;
S204) adopt hydrogen peroxide solution that the silicon chip of solar cell that water cleans is cleaned:
Hydrogen peroxide solution has strong oxidizing property, can be dissolved in the hydrogen peroxide solution with the oxidation in organic solvent that remains in the silicon chip of solar cell surface and with its reaction product, and then can remove the organic solvent on silicon chip of solar cell surface;
S205) adopt water that the silicon chip of solar cell that cleans through hydrogen peroxide solution is cleaned, obtain the silicon chip of solar cell that cleans totallyer:
Water cleaning solar energy cell silicon chip, flush away remain in the hydrogen peroxide solution of solar cell surface and are dissolved in the reaction product in the hydrogen peroxide solution, have finally obtained the silicon chip of solar cell that cleans totallyer, can produce again and utilize.
In the cleaning method of the silicon chip of solar cell that the foregoing description provides; Slide cassette generally uses the acid and alkali-resistance material; The quantity that can hold silicon chip of solar cell in the slide cassette is 25,50 or 100 etc., and quantity is 25 multiple, is convenient to statistics and produces.Usually use 25 on chip or 50 slide cassettes on chip.
Preferably, in the cleaning method of the silicon chip of solar cell that the foregoing description provides, step S202) in, in the alkaline cleaner solution, the volume ratio of pure water and alkaline cleaner is between 7.5: 1 and 15: 1.Certainly, the composition volume ratio of alkaline cleaner solution also can be other ratio, washes metal dust as long as can guarantee alkaline cleaner solution, and the present invention does not limit this particularly.
Preferably, in the cleaning method of the silicon chip of solar cell that the foregoing description provides, step S202) in, adopt time that alkaline cleaner solution cleans silicon chip of solar cell between 30-150min.The time that alkaline cleaner solution cleans is relevant with the concentration of alkaline cleaner solution, and concentration is high more, and required scavenging period is short more.
Preferably, in the cleaning method of the silicon chip of solar cell that the foregoing description provides, step S202) in, through adding ultrasonic wave in the ultrasonic generator alcaliotropism detergent solution.Generally ultrasonic generator is arranged on the bottom of slide cassette.
Preferably, in the cleaning method of the silicon chip of solar cell that the foregoing description provides, said step S203) and/or step S205) in, being specially through the mode of submergence or spray of cleaning cleaned.Certainly, the present invention does not limit the mode of water cleaning solar energy cell silicon chip particularly, can the solution that remain in the silicon chip of solar cell surface be cleaned up as long as can guarantee water.
To the above-mentioned explanation of the disclosed embodiments, make this area professional and technical personnel can realize or use the present invention.Multiple modification to these embodiment will be conspicuous concerning those skilled in the art, and defined General Principle can realize under the situation that does not break away from the spirit or scope of the present invention in other embodiments among this paper.Therefore, the present invention will can not be restricted to these embodiment shown in this paper, but will meet and principle disclosed herein and features of novelty the wideest corresponding to scope.
Claims (8)
1. the cleaning method of a silicon chip of solar cell is characterized in that, comprising:
1) adopt alcohol or terpinol to clean said silicon chip of solar cell, the silicon chip of solar cell that is tentatively cleaned;
2) adopt alkaline cleaner solution that the silicon chip of solar cell of said preliminary cleaning is cleaned, obtain the silicon chip of solar cell that alkalescence is cleaned;
3) silicon chip of solar cell that adopts water that said alkalescence is cleaned cleans;
4) adopt hydrogen peroxide solution that the said silicon chip of solar cell that water cleans is cleaned;
5) adopt water that the said silicon chip of solar cell that cleans through said hydrogen peroxide solution is cleaned, obtain the said silicon chip of solar cell that cleans totallyer.
2. the cleaning method of silicon chip of solar cell according to claim 1 is characterized in that, said step 2) also comprise: in said alkaline cleaner solution, add ultrasonic wave, carry out ultrasonic cleaning.
3. the cleaning method of silicon chip of solar cell according to claim 2 is characterized in that, said step 2) in, in the said alkaline cleaner solution, the volume ratio of pure water and alkaline cleaner is between 7.5: 1 and 15: 1.
4. the cleaning method of silicon chip of solar cell according to claim 3 is characterized in that, said step 2) in, adopt time that said alkaline cleaner solution cleans said silicon chip of solar cell between 30-150min.
5. the cleaning method of silicon chip of solar cell according to claim 2; It is characterized in that; Said step 2) in, the silicon chip of solar cell of said preliminary cleaning is put into slide cassette clean, in said alkaline cleaner solution, add ultrasonic wave through ultrasonic generator.
6. the cleaning method of silicon chip of solar cell according to claim 1 is characterized in that, in the said step 4), the mass concentration of hydrogen peroxide solution is between 5%-30% in the said hydrogen peroxide solution.
7. the cleaning method of silicon chip of solar cell according to claim 6 is characterized in that, in the said step 4), adopts time that said hydrogen peroxide solution cleans said silicon chip of solar cell between 30-75min.
8. according to the cleaning method of any described silicon chip of solar cell among the claim 1-6, it is characterized in that in said step 3) and/or the step 5), being specially through the mode of submergence or spray of said cleaning cleaned.
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| CN108511321A (en) * | 2018-03-19 | 2018-09-07 | 徐州鑫宇光伏科技有限公司 | Do over again cleaning method and the reworking method of black silicon silicon chip after printing |
| CN109530374A (en) * | 2018-11-21 | 2019-03-29 | 上海超硅半导体有限公司 | A kind of wafer cassette cleaning method |
| CN110416064A (en) * | 2019-07-08 | 2019-11-05 | 阜宁苏民绿色能源科技有限公司 | A method of removal silicon wafer greasy dirt |
| CN111613519A (en) * | 2020-03-19 | 2020-09-01 | 江苏高照新能源发展有限公司 | Monocrystalline silicon wafer cleaning method |
| CN112436074A (en) * | 2020-11-30 | 2021-03-02 | 中建材浚鑫科技有限公司 | Texturing and cleaning process suitable for double-sided silicon solar cell |
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| CN108511321A (en) * | 2018-03-19 | 2018-09-07 | 徐州鑫宇光伏科技有限公司 | Do over again cleaning method and the reworking method of black silicon silicon chip after printing |
| CN109530374A (en) * | 2018-11-21 | 2019-03-29 | 上海超硅半导体有限公司 | A kind of wafer cassette cleaning method |
| CN109530374B (en) * | 2018-11-21 | 2021-07-27 | 上海超硅半导体有限公司 | Wafer box cleaning method |
| CN110416064A (en) * | 2019-07-08 | 2019-11-05 | 阜宁苏民绿色能源科技有限公司 | A method of removal silicon wafer greasy dirt |
| CN110416064B (en) * | 2019-07-08 | 2021-07-16 | 阜宁苏民绿色能源科技有限公司 | Method for removing oil stains on silicon wafer |
| CN111613519A (en) * | 2020-03-19 | 2020-09-01 | 江苏高照新能源发展有限公司 | Monocrystalline silicon wafer cleaning method |
| CN112436074A (en) * | 2020-11-30 | 2021-03-02 | 中建材浚鑫科技有限公司 | Texturing and cleaning process suitable for double-sided silicon solar cell |
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| CN102592972B (en) | 2014-12-31 |
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