CA2429150A1 - Cold antireflection layer deposition process - Google Patents

Cold antireflection layer deposition process Download PDF

Info

Publication number
CA2429150A1
CA2429150A1 CA002429150A CA2429150A CA2429150A1 CA 2429150 A1 CA2429150 A1 CA 2429150A1 CA 002429150 A CA002429150 A CA 002429150A CA 2429150 A CA2429150 A CA 2429150A CA 2429150 A1 CA2429150 A1 CA 2429150A1
Authority
CA
Canada
Prior art keywords
layer
refractive index
mgf2
index different
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002429150A
Other languages
French (fr)
Other versions
CA2429150C (en
Inventor
Yvon Helmstetter
Jean-Daniel Bernhard
Frederic Arrouy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EssilorLuxottica SA
Original Assignee
Essilor International
Yvon Helmstetter
Jean-Daniel Bernhard
Frederic Arrouy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Essilor International, Yvon Helmstetter, Jean-Daniel Bernhard, Frederic Arrouy filed Critical Essilor International
Publication of CA2429150A1 publication Critical patent/CA2429150A1/en
Application granted granted Critical
Publication of CA2429150C publication Critical patent/CA2429150C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree

Abstract

The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 ~C, comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

Claims (21)

1. A process for manufacturing a multilayer antireflection coating by vacuum evaporation on an organic substrate (1) at a temperature below 150°C, comprising the following steps:
- deposition of at least one layer (4, 4') of material of refractive index different from MgF2;
- preparation of the surface of the substrate thus coated; and - deposition of an outer layer (5) of MgF2 without ion assistance
2. The process as claimed in claim 1, in which the vacuum evaporation is carried out at a temperature below 100°C.
3. The process as claimed in claim 1 or 2, in which the surface preparation is chosen from among the following treatments: ion bombardment, electron bombardment and etching carried out ex situ.
4. The process as claimed in either of claims 2 and 3, in which said layer is made of a material having a high refractive index chosen from a group of simple or mixed oxides or mixtures of metals of groups IIIb, IVb, Vb, VIb, VIIb and lanthanides.
5. The process as claimed in one of claims 2 to 4, in which the metals are chosen from the group Pr, La, Ti, Zr, Ta and Hf.
6. The process as claimed in one of claims 2 to 5, in which the materials having a high refractive index are chosen from the group consisting of ZrO2, PrTiO3, Pr2O3/TiO2 mixtures, Pr6O11/TiO2 mixtures, La2O3/TiO2 mixtures and ZrO2/TiO2 mixtures.
7. The process as claimed in one of claims 1 to 6, characterized in that said layer of material of refractive index different from MgF2 is a hard coating.
8. The process as claimed in one of claims 1 to 7, characterized in that said layer of material of refractive index different from MgF2 is an impact-resistant layer.
9. The process as claimed in one of claims 1 to 8, characterized in that said layer of material of refractive index different from MgF2 is an antifringe layer.
10. The process as claimed in one of claims 1 to 9, comprising, before the layer (4, 4') of material of refractive index different from MgF2 is deposited, the prior step of depositing a layer (3) of low refractive index.
11. The process as claimed in claim 10, in which the layer (3) of low refractive index has a thickness of between 40 and 200 nm, preferably 60 nm.
12. The process as claimed in one of claims 1 to 11, in which the step of depositing the material of refractive index different from MgF2 comprises the following steps:
deposition of a first layer (4) of material of refractive index different from MgF2;
- deposition of a layer (3') of material having a low refractive index;
and - deposition of a second layer (4') of material of refractive index different from MgF2.
13. The process as claimed in claim 12, in which the layer having a low refractive index is made of SiO2.
14. The process as claimed in either of claims 12 and 13, in which the first layer (4) of material of refractive index different from MgF2 has a thickness of 10 to 40 nm.
15. The process as claimed in one of claims 12 to 14, in which the layer (3') of material having a low refractive index has a thickness of 10 to 100 nm, preferably 40 nm.
16. The process as claimed in one of claims 12 to 15, in which the second layer (4') of material of refractive index different from MgF2 has a thickness of 50 to 150 nm, preferably 120 to 130 nm.
17. The process as claimed in one of claims 1 to 16, in which the organic substrate (1) is composed of polycarbonate.
18. The process as claimed in one of claims 1 to 17, in which the outer layer (5) of MgF2 has a thickness of 50 to 100 nm, preferably 80 to 90 nm.
19. The process as claimed in one of claims 1 to 18, comprising the subsequent step of depositing a layer (6) that modifies the surface energy.
20. The use of the process as claimed in one of claims 1 to 19 to improve the adhesion of a multilayer antireflection coating that includes MgF2 on the substrate.
21. An organic substrate coated with a multilayer antireflection coating, in particular an ophthalmic lens that can be obtained by the process as claimed in one of claims 1 to 19.
CA2429150A 2000-11-28 2001-11-26 Cold antireflection layer deposition process Expired - Fee Related CA2429150C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR00/15334 2000-11-28
FR0015334A FR2817267B1 (en) 2000-11-28 2000-11-28 METHOD OF DEPOSITING ANTI-REFLECTIVE COLD LAYER ON ORGANIC SUBSTRATE
PCT/FR2001/003723 WO2002044440A1 (en) 2000-11-28 2001-11-26 Method for cold process deposition of an antiglare layer

Publications (2)

Publication Number Publication Date
CA2429150A1 true CA2429150A1 (en) 2002-06-06
CA2429150C CA2429150C (en) 2010-03-30

Family

ID=8856948

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2429150A Expired - Fee Related CA2429150C (en) 2000-11-28 2001-11-26 Cold antireflection layer deposition process

Country Status (14)

Country Link
US (1) US7175878B2 (en)
EP (1) EP1339893B1 (en)
JP (1) JP2004514939A (en)
KR (1) KR100845244B1 (en)
CN (1) CN1239733C (en)
AT (1) ATE386830T1 (en)
AU (2) AU2204302A (en)
BR (1) BR0115898B1 (en)
CA (1) CA2429150C (en)
DE (1) DE60132914T2 (en)
ES (1) ES2301578T3 (en)
FR (1) FR2817267B1 (en)
PT (1) PT1339893E (en)
WO (1) WO2002044440A1 (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3555844B2 (en) 1999-04-09 2004-08-18 三宅 正二郎 Sliding member and manufacturing method thereof
US6969198B2 (en) 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
JP4863152B2 (en) 2003-07-31 2012-01-25 日産自動車株式会社 gear
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
FR2861182B1 (en) * 2003-10-16 2006-02-03 Essilor Int TRANSPARENT ORGANIC SUBSTRATE COMPRISING A TEMPERATURE RESISTANT MULTILAYER ANTIREFLECTION STACK
JP5135753B2 (en) * 2006-02-01 2013-02-06 セイコーエプソン株式会社 Optical article
FR2903197B1 (en) * 2006-06-28 2009-01-16 Essilor Int OPTICAL ARTICLE COATED WITH A TEMPERATURE-RESISTANT MULTILAYER COATED ANTI-REFLECTING COATING AND COATING, AND METHOD OF MANUFACTURING THE SAME
US8318245B2 (en) 2007-02-23 2012-11-27 Essilor International (Compagnie Generale D'optique) Method for producing an optical article coated with an antireflection or a reflective coating having improved adhesion and abrasion resistance properties
FR2913116B1 (en) * 2007-02-23 2009-08-28 Essilor Int METHOD FOR MANUFACTURING OPTICAL ARTICLE COATED WITH AN ANTI-REFLECTIVE OR REFLECTIVE COATING HAVING IMPROVED ADHESION AND ABRASION RESISTANCE PROPERTIES
JP5308640B2 (en) * 2007-08-06 2013-10-09 Ｈｏｙａ株式会社 Antireflection film and optical member using the same
JP4693836B2 (en) * 2007-12-17 2011-06-01 日本電波工業株式会社 Infrared cut filter and manufacturing method thereof
US8691331B2 (en) * 2009-02-09 2014-04-08 Prashant D. Santan Surface modification of hydrophobic and/or oleophobic coatings
US20110199680A1 (en) * 2010-01-22 2011-08-18 Oakley, Inc. Eyewear with three-dimensional viewing capability
BR112012017964A2 (en) * 2010-01-22 2019-09-24 Oakley Inc lens and lens block forming methods for 3d glasses and lens for the same
WO2011139856A2 (en) 2010-04-29 2011-11-10 Battelle Memorial Institute High refractive index composition
JP5589581B2 (en) * 2010-06-11 2014-09-17 コニカミノルタ株式会社 Optical element and manufacturing method thereof
FR2975507B1 (en) * 2011-05-16 2014-01-10 Essilor Int ANTI-REFLECTIVE OPHTHALMIC LENS AND METHOD OF MANUFACTURING THE SAME
JP5699364B2 (en) * 2012-12-21 2015-04-08 株式会社麗光 High hardness hard coat film
CN103059617B (en) * 2013-01-05 2015-07-22 江西安源光伏玻璃有限责任公司 Preparation method for nanometer anti-reflection self-cleaning coating solution
EP3346023A1 (en) * 2017-01-05 2018-07-11 Essilor International Method for layer by layer optimization of a thin film

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3330681A (en) * 1963-07-15 1967-07-11 Eastman Kodak Co Low reflection coatings for plastics
JPS58167124A (en) * 1982-03-29 1983-10-03 Nippon Oil & Fats Co Ltd Manufacture of plastic lens
JPS6022101A (en) * 1983-07-18 1985-02-04 Matsushita Electric Ind Co Ltd Antireflection film for plastic optical parts
JPS60129702A (en) * 1983-12-16 1985-07-11 Matsushita Electric Ind Co Ltd Antireflection film of plastic lens
JPS61250601A (en) 1985-04-30 1986-11-07 Toray Ind Inc Optical material having antireflection property and its production
US5783299A (en) * 1986-01-21 1998-07-21 Seiko Epson Corporation Polarizer plate with anti-stain layer
JPS62186203A (en) * 1986-02-12 1987-08-14 Seiko Epson Corp Antireflection film for plastic optical parts
JPS63228101A (en) * 1987-03-17 1988-09-22 Nippon Sheet Glass Co Ltd Antistatic non-reflection plate having stain resistance
US5764416A (en) * 1988-04-19 1998-06-09 Litton Systems, Inc. Fault tolerant antireflective coatings
US5316791A (en) * 1993-01-21 1994-05-31 Sdc Coatings Inc. Process for improving impact resistance of coated plastic substrates
FR2702486B1 (en) 1993-03-08 1995-04-21 Essilor Int Abrasion resistant coating compositions based on silane hydrolysates and aluminum compounds, and corresponding coated articles resistant to abrasion and impact.
EP0619504A1 (en) 1993-04-08 1994-10-12 Optische Werke G. Rodenstock Antireflection coating
JPH0727902A (en) * 1993-07-13 1995-01-31 Dainippon Printing Co Ltd Antireflection film and production thereof
JPH0776048A (en) 1993-09-08 1995-03-20 Toray Ind Inc Manufacture of molded product
JP3433845B2 (en) * 1994-08-02 2003-08-04 尾池工業株式会社 Anti-reflection film with excellent scratch resistance and durability
JP3359178B2 (en) 1995-02-22 2002-12-24 沖電気工業株式会社 Layout method of semiconductor integrated circuit
US5939189A (en) * 1995-05-09 1999-08-17 Flex Products, Inc. Flexible plastic substrate with anti-reflection coating having low reflective color and method
US5920431A (en) * 1996-06-27 1999-07-06 Konica Corporation Optical member having antireflection film thereon
JPH10123303A (en) * 1996-10-18 1998-05-15 Victor Co Of Japan Ltd Antireflection optical parts
EP0947601A1 (en) 1998-03-26 1999-10-06 ESSILOR INTERNATIONAL Compagnie Générale d'Optique Organic substrate having optical layers deposited by magnetron sputtering and method for preparing it
JP3601580B2 (en) * 1999-05-20 2004-12-15 信越化学工業株式会社 Perfluoropolyether-modified aminosilane and surface treatment agent, and article formed with the aminosilane coating
US6505935B2 (en) * 2000-07-21 2003-01-14 Abby Ayoub Optical lens coating and method

Also Published As

Publication number Publication date
PT1339893E (en) 2008-05-13
WO2002044440A1 (en) 2002-06-06
KR20030057558A (en) 2003-07-04
CN1478154A (en) 2004-02-25
FR2817267B1 (en) 2003-08-29
EP1339893A1 (en) 2003-09-03
ATE386830T1 (en) 2008-03-15
FR2817267A1 (en) 2002-05-31
DE60132914D1 (en) 2008-04-03
AU2002222043B2 (en) 2006-10-12
CN1239733C (en) 2006-02-01
BR0115898B1 (en) 2011-09-20
AU2204302A (en) 2002-06-11
EP1339893B1 (en) 2008-02-20
DE60132914T2 (en) 2009-03-12
KR100845244B1 (en) 2008-07-10
CA2429150C (en) 2010-03-30
JP2004514939A (en) 2004-05-20
BR0115898A (en) 2003-11-04
ES2301578T3 (en) 2008-07-01
US20040067351A1 (en) 2004-04-08
US7175878B2 (en) 2007-02-13

Similar Documents

Publication Publication Date Title
CA2429150A1 (en) Cold antireflection layer deposition process
JP5509691B2 (en) Lens and manufacturing method thereof
CA2477845A1 (en) Thin film coating having transparent base layer
CA2428860A1 (en) High shading performance coatings
GB1208962A (en) Method of fabricating thin films and membranes
KR20190010221A (en) Infrared optical lens equipped with ta-C and yttrium oxide thin film
JPH0282201A (en) Rear reflecting mirror of multilayered film for optical parts made of synthetic resin
US7575798B2 (en) Optical element with an opaque chrome coating having an aperture and method of making same
JP2002205353A (en) Vapor deposited composition, method for forming antireflection film using the composition, and optical member
JPH01273001A (en) Antireflection film of optical parts made of synthetic resin
JPH07104102A (en) Water repellant reflection preventive film for glass-made optical parts and production thereof
JPH06273601A (en) Antireflection film of optical parts made of synthetic resin
JPH10123303A (en) Antireflection optical parts
EP1802452B1 (en) Optical element with an opaque chrome coating having an aperture and method of making same
JPH01257801A (en) Antireflection film
JPS62100701A (en) Production of plastic optical parts having antireflection film
JPH09211204A (en) Film forming method of antireflection film on plastic film
JP2019066600A (en) Plastic lens and manufacturing method for the same
JPH04128801A (en) Antireflection film to optical parts made of synthetic resin
JPS6296901A (en) Synthetic resin lens
JPS63217302A (en) Multlayered optical element
JPH01200304A (en) Multilayered optical film
JPH03255401A (en) Formation of mgf2 film on plastic substrate
JPS6326603A (en) Reflection mirror consisting of synthetic resin member
JPH01283501A (en) Reflection preventive film

Legal Events

Date Code Title Description
EEER Examination request
MKLA Lapsed

Effective date: 20171127